SCHEMBL172120

SCHEMBL172120

O=C1c2ccccc2-c2ccccc2C1(c1ccc(O)c(F)c1)c1ccc(O)c(F)c1

nearest known ligand 0.51

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ESR1 P03372 4/20 0.51
ESR2 Q92731 4/20 0.51
DHFR P00374 2/20 0.49
S100A4 P26447 2/20 0.40
MEN1 O00255 5/20 0.39
KMT2A Q03164 5/20 0.39
LMNA P02545 4/20 0.39
MAPT P10636 4/20 0.39
SMN1; SMN2 Q16637 3/20 0.39
TDP1 Q9NUW8 2/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
XBP1 P17861 1/20 0.39
NPSR1 Q6W5P4 1/20 0.39
POLB P06746 1/20 0.39
GAA P10253 1/20 0.37
KDM4E B2RXH2 1/20 0.37
OPRK1 P41145 1/20 0.37
JAK2 O60674 1/20 0.36
ALDH1A1 P00352 2/20 0.35
TSHR P16473 2/20 0.35

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL29703330 0.88 ESR1 (0.65) ESR1ESR2DHFRMEN1KMT2A
SCHEMBL217779 0.88 ESR1 (0.65) ESR1ESR2DHFRMEN1KMT2A
SCHEMBL172118 0.83 DHFR (0.47) ESR1ESR2DHFRS100A4MEN1
SCHEMBL172169 0.82 ESR1 (0.77) ESR1ESR2S100A4MEN1KMT2A
SCHEMBL170122 0.82 ESR1 (0.51) ESR1ESR2DHFRS100A4MEN1
SCHEMBL172119 0.82 ESR2 (0.51) ESR1ESR2DHFRS100A4MEN1
SCHEMBL13080606 0.80 ESR1 (0.73) ESR1ESR2S100A4MEN1KMT2A
SCHEMBL13080601 0.80 ESR1 (0.52) ESR1ESR2S100A4MEN1KMT2A
SCHEMBL171820 0.78 ESR1 (0.51) ESR1ESR2S100A4MEN1KMT2A
SCHEMBL172184 0.74 S100A4 (0.50) ESR1ESR2S100A4MEN1KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8283433-B2 Polycarbonate resin and electrophotographic photosensitive body using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-10-09 US disclosed
US-8283433-B2 Polycarbonate resin and electrophotographic photosensitive body using the same MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2012-10-09 US disclosed
EP-2048180-B1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL CO (JP) 2012-03-07 EP disclosed
US-20100047703-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 US disclosed
US-20100047703-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-02-25 US disclosed
EP-2048180-A1 POLYCARBONATE RESIN AND ELECTROPHOTOGRAPHIC PHOTOSENSITIVE BODY USING THE SAME MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2009-04-15 EP disclosed