Known targets — ChEMBL curated mechanism
ACHECHKACHRM1CHRM2CHRM3CHRM4CHRM5CHRNA1CHRNB1CHRNDCHRNECHRNGHRH2OPRM1
The experimentally established mechanism targets of Bromide. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.
Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ACHE known ✓ | P22303 | 2/20 | 0.38 |
| ▸ | NPC1 | O15118 | 5/20 | 0.72 |
| ▸ | RAB9A | P51151 | 4/20 | 0.72 |
| ▸ | NLRP3 | Q96P20 | 2/20 | 0.72 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.72 |
| ▸ | MEN1 | O00255 | 6/20 | 0.56 |
| ▸ | KMT2A | Q03164 | 6/20 | 0.56 |
| ▸ | POLB | P06746 | 3/20 | 0.56 |
| ▸ | USP2 | O75604 | 2/20 | 0.56 |
| ▸ | BLM | P54132 | 1/20 | 0.56 |
| ▸ | TERT | O14746 | 1/20 | 0.43 |
| ▸ | RXFP1 | Q9HBX9 | 1/20 | 0.40 |
| ▸ | MAPT | P10636 | 9/20 | 0.39 |
| ▸ | ALDH1A1 | P00352 | 5/20 | 0.39 |
| ▸ | KDM4E | B2RXH2 | 5/20 | 0.39 |
| ▸ | HTT | P42858 | 5/20 | 0.38 |
| ▸ | GAA | P10253 | 4/20 | 0.38 |
| ▸ | MAPK1 | P28482 | 2/20 | 0.38 |
| ▸ | BCHE | P06276 | 2/20 | 0.38 |
| ▸ | KDM1A | O60341 | 1/20 | 0.38 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2984261 | 0.99 | NPC1 (0.73) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL29536468 | 0.91 | NPC1 (0.85) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| SCHEMBL19970699 | 0.91 | NPC1 (0.85) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL28418789 | 0.87 | NPC1 (0.79) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| SCHEMBL3130463 | 0.84 | L3MBTL1 (1.00) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL2981717 | 0.84 | L3MBTL1 (0.73) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL930666 | 0.84 | L3MBTL1 (1.00) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL2974542 | 0.84 | NPC1 (0.73) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| SCHEMBL19970702 | 0.84 | L3MBTL1 (0.73) | NPC1RAB9ANLRP3L3MBTL1MEN1 | |
| Hydrochloric Acid SCHEMBL865599 | 0.82 | NPC1 (0.74) | NPC1RAB9ANLRP3L3MBTL1MEN1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | claimed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | claimed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | claimed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | claimed |
| US-7786303-B2 | Acidic bath for electrolytically depositing a copper deposit containing halogenated or pseudohalogenated monomeric phenazinium compounds | ATOTECH DEUTSCHLAND GMBH (DE) | 2010-08-31 | — | — | US | disclosed |
| EP-1720842-B1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2008-05-07 | — | — | EP | disclosed |
| US-20070108062-A1 | 7-Amino-2,8-dimethyl-3-thiocyanato-5-phenyl-phenazinium tetrafluooroboride; uniform and mirror bright copper coatings that are leveled and ductile as well using a relatively high current density; quality; high purity for decoative coatings; durable bath operation | ATOTECH DEUTSCHLAND GMBH (DE) | 2007-05-17 | — | — | US | disclosed |
| EP-1720842-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2006-11-15 | — | — | EP | disclosed |
| WO-2005049584-A1 | ACIDIC BATH FOR ELECTROLYTICALLY DEPOSITING A COPPER DEPOSIT CONTAINING HALOGENATED OR PSEUDOHALOGENATED MONOMERIC PHENAZINIUM COMPOUNDS | ATOTECH DEUTSCHLAND GMBH (DE) | 2005-06-02 | — | — | WO | disclosed |