Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 2/20 | 0.52 |
| ▸ | LMNA | P02545 | 3/20 | 0.46 |
| ▸ | TSHR | P16473 | 3/20 | 0.46 |
| ▸ | THRB | P10828 | 2/20 | 0.46 |
| ▸ | BLM | P54132 | 2/20 | 0.46 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.46 |
| ▸ | NPSR1 | Q6W5P4 | 2/20 | 0.46 |
| ▸ | GABRR3 | A8MPY1 | 1/20 | 0.46 |
| ▸ | GABRP | O00591 | 1/20 | 0.46 |
| ▸ | GABRD | O14764 | 1/20 | 0.46 |
| ▸ | HDAC3 | O15379 | 1/20 | 0.46 |
| ▸ | GABBR2 | O75899 | 1/20 | 0.46 |
| ▸ | GABRA1 | P14867 | 1/20 | 0.46 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.46 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.46 |
| ▸ | GABRR1 | P24046 | 1/20 | 0.46 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.46 |
| ▸ | GABRR2 | P28476 | 1/20 | 0.46 |
| ▸ | SLC6A1 | P30531 | 1/20 | 0.46 |
| ▸ | GABRA5 | P31644 | 1/20 | 0.46 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Hydrochloric Acid SCHEMBL25178227 | 0.98 | CYP1A2 (0.50) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL20010546 | 0.92 | CYP1A2 (0.58) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL5364699 | 0.91 | LMNA (0.50) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL15658062 | 0.90 | ALDH1A1 (0.43) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL29453876 | 0.87 | ALDH1A1 (0.42) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL10678886 | 0.87 | CYP1A2 (0.54) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL7257426 | 0.85 | LMNA (0.54) | CYP1A2LMNATSHRTHRBBLM | |
| Potassium SCHEMBL29453861 | 0.85 | ALDH1A1 (0.40) | CYP1A2LMNATSHRTHRBKMT2A | |
| SCHEMBL1537202 | 0.84 | ALDH1A1 (0.43) | CYP1A2LMNATSHRTHRBBLM | |
| SCHEMBL887119 | 0.84 | NFKB1 (0.55) | CYP1A2LMNATSHRTHRBBLM |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-4829078-A | CEREBRAL EDEMA | ONO PHARMACEUTICAL CO., LTD. (JP) | 1989-05-09 | — | — | US | claimed |
| EP-2614123-B1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2017-06-28 | — | — | EP | disclosed |
| US-20130200039-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-08-08 | — | — | US | disclosed |
| EP-2614123-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| EP-2613910-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| EP-2614122-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2013-07-17 | — | — | EP | disclosed |
| CN-103210047-A | Aqueous polishing compositions containing N-substituted diazenium dioxides and/or N'-hydroxy-diazenium oxide salts | BASF SE | 2013-07-17 | — | — | CN | disclosed |
| US-20130168348-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| US-20130171824-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2013-07-04 | — | — | US | disclosed |
| CN-103189457-A | Aqueous polishing composition and process for chemically mechanically polishing substrate materials for electrical, mechanical and optical devices | BASF SE | 2013-07-03 | — | — | CN | disclosed |
| US-20130161285-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2013-06-27 | — | — | US | disclosed |
| WO-2012032469-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATE MATERIALS FOR ELECTRICAL, MECHANICAL AND OPTICAL DEVICES | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| WO-2012032467-A1 | PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC FILMS AND POLYSILICON AND/OR SILICON NITRIDE FILMS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| WO-2012032451-A1 | AQUEOUS POLISHING COMPOSITION AND PROCESS FOR CHEMICALLY MECHANICALLY POLISHING SUBSTRATES CONTAINING SILICON OXIDE DIELECTRIC AND POLYSILICON FILMS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| WO-2012032466-A1 | AQUEOUS POLISHING COMPOSITIONS CONTAINING N-SUBSTITUTED DIAZENIUM DIOXIDES AND/OR N'-HYDROXY-DIAZENIUM OXIDE SALTS | BASF SE (DE) | 2012-03-15 | — | — | WO | disclosed |
| EP-2428541-A1 | Aqueous polishing composition and process for chemically mechanically polishing substrates containing silicon oxide dielectric and polysilicon films | BASF SE (DE) | 2012-03-14 | — | — | EP | disclosed |
| WO-1995003321-A1 | METHOD FOR ENDOMODIFICATION OF PROTEINS | BIONEBRASKA, INC. (US) | 1995-02-02 | — | — | WO | disclosed |