Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC2A1 | P11166 | 2/20 | 0.38 |
| ▸ | L3MBTL1 | Q9Y468 | 2/20 | 0.35 |
| ▸ | GAA | P10253 | 1/20 | 0.35 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.35 |
| ▸ | CNR1 | P21554 | 3/20 | 0.35 |
| ▸ | CNR2 | P34972 | 3/20 | 0.35 |
| ▸ | MEN1 | O00255 | 2/20 | 0.34 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.34 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | HTT | P42858 | 1/20 | 0.33 |
| ▸ | MCOLN3 | Q8TDD5 | 1/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
| ▸ | LMNA | P02545 | 1/20 | 0.33 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.33 |
| ▸ | FABP4 | P15090 | 6/20 | 0.32 |
| ▸ | FABP5 | Q01469 | 6/20 | 0.32 |
| ▸ | THRA | P10827 | 1/20 | 0.31 |
| ▸ | THRB | P10828 | 1/20 | 0.31 |
| ▸ | MAPK1 | P28482 | 1/20 | 0.31 |
| ▸ | RECQL | P46063 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL190939 | 1.00 | SLC2A1 (0.38) | SLC2A1L3MBTL1GAATDP1CNR1 | |
| SCHEMBL448402 | 0.99 | SLC2A1 (0.37) | SLC2A1L3MBTL1GAATDP1CNR1 | |
| SCHEMBL29407585 | 0.99 | SLC2A1 (0.37) | SLC2A1L3MBTL1GAATDP1CNR1 | |
| SCHEMBL701332 | 0.95 | KMT2A (0.39) | SLC2A1CNR1CNR2MEN1KMT2A | |
| SCHEMBL700902 | 0.94 | KMT2A (0.38) | SLC2A1CNR1CNR2MEN1KMT2A | |
| SCHEMBL3159159 | 0.91 | HTT (0.32) | MEN1KMT2ATSHRHTTMCOLN3 | |
| SCHEMBL701702 | 0.91 | TSHR (0.42) | GAATDP1MEN1KMT2ATSHR | |
| SCHEMBL5972861 | 0.90 | ALDH1A1 (0.34) | MEN1KMT2ATSHRHTTMCOLN3 | |
| SCHEMBL3163450 | 0.90 | HTT (0.31) | MEN1KMT2ATSHRHTTMCOLN3 | |
| SCHEMBL704517 | 0.90 | TSHR (0.41) | GAATDP1MEN1KMT2ATSHR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-4405094-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2024-07-31 | — | — | EP | disclosed |
| US-20240076656-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-03-07 | — | — | US | disclosed |
| WO-2024006827-A1 | METHODS AND SYSTEMS FOR LIGHT-CONTROLLED SURFACE PATTERNING USING PHOTOMASKS | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006798-A1 | HIGH DEFINITION MOLECULAR ARRAY FEATURE GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| WO-2024006799-A1 | COVALENT ATTACHMENT OF SPLINT OLIGONUCLEOTIDES FOR MOLECULAR ARRAY GENERATION USING LIGATION | 10X GENOMICS, INC. (US) | 2024-01-04 | — | — | WO | disclosed |
| EP-4271511-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X Genomics, Inc. (US) | 2023-11-08 | — | — | EP | disclosed |
| EP-4270448-A1 | FILM FORMATION METHOD AND ARTICLE MANUFACTURING METHOD | CANON KABUSHIKI KAISHA (JP) | 2023-11-01 | — | — | EP | disclosed |
| CN-111562720-B | Photo-sensitized chemically amplified resist material, pattern forming method, semiconductor device, mask for lithography, and template for nanoimprint | 东京毅力科创株式会社 | 2023-09-29 | — | — | CN | disclosed |
| CN-116635210-A | Film forming method and article manufacturing method | 佳能株式会社 | 2023-08-22 | — | — | CN | disclosed |
| WO-2023021971-A1 | METHOD FOR FORMING RESIST UNDERLAYER FILM, METHOD FOR PRODUCING SEMICONDUCTOR SUBSTRATE, COMPOSITION FOR FORMING RESIST UNDERLAYER FILM, AND RESIST UNDERLAYER FILM, | JSR株式会社 | 2023-02-23 | — | — | WO | disclosed |
| EP-4058848-A1 | POSITIVE WORKING PHOTOSENSITIVE MATERIAL | Merck Patent GmbH (DE) | 2022-09-21 | — | — | EP | disclosed |
| WO-2022147140-A1 | MOLECULAR ARRAY GENERATION USING PHOTORESIST | 10X GENOMICS, INC. (US) | 2022-07-07 | — | — | WO | disclosed |