SCHEMBL701332

SCHEMBL701332

CCCOc1ccc([S+]2CCCC2)c2ccccc12.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.39

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 4/20 0.39
MEN1 O00255 3/20 0.39
CNR1 P21554 1/20 0.34
CNR2 P34972 1/20 0.34
TSHR P16473 3/20 0.34
HTT P42858 1/20 0.34
MCOLN3 Q8TDD5 1/20 0.34
ALDH1A1 P00352 1/20 0.34
LMNA P02545 1/20 0.34
SLC2A1 P11166 1/20 0.32
PLA2G1B P04054 1/20 0.31
HSP90AA1 P07900 1/20 0.31
ATG4B Q9Y4P1 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL700902 0.99 KMT2A (0.38) KMT2AMEN1CNR1CNR2TSHR
SCHEMBL29754149 0.95 SLC2A1 (0.38) KMT2AMEN1CNR1CNR2TSHR
SCHEMBL190939 0.95 SLC2A1 (0.38) KMT2AMEN1CNR1CNR2TSHR
SCHEMBL448402 0.94 SLC2A1 (0.37) KMT2AMEN1CNR1CNR2TSHR
SCHEMBL29407585 0.94 SLC2A1 (0.37) KMT2AMEN1CNR1CNR2TSHR
SCHEMBL3159159 0.92 HTT (0.32) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL701702 0.92 TSHR (0.42) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL5972861 0.91 ALDH1A1 (0.34) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL3163450 0.91 HTT (0.31) KMT2AMEN1TSHRHTTMCOLN3
SCHEMBL704517 0.91 TSHR (0.41) KMT2AMEN1TSHRHTTMCOLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 12 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed
US-7202016-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2007-04-10 US disclosed
EP-1085379-B1 Radiation-sensitive resin composition JSR CORP (JP) 2006-01-04 EP disclosed
US-20050214680-A1 Radiation-sensitive resin composition MIYAJI MASAAKI 2005-09-29 US disclosed
US-6933094-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2005-08-23 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed