SCHEMBL701702

SCHEMBL701702

CCOc1ccc([S+]2CCCC2)c2ccccc12.O=S(=O)([O-])C(F)(F)C(F)(F)C(F)(F)C(F)(F)F

nearest known ligand 0.42

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
TSHR P16473 7/20 0.42
ALDH1A1 P00352 6/20 0.42
LMNA P02545 6/20 0.42
HTT P42858 4/20 0.42
MCOLN3 Q8TDD5 1/20 0.42
HPGD P15428 5/20 0.36
MAPT P10636 4/20 0.36
NPSR1 Q6W5P4 3/20 0.36
ALOX12 P18054 2/20 0.36
NTSR1 P30989 1/20 0.36
CCR6 P51684 1/20 0.36
MCL1 Q07820 1/20 0.36
SMN1; SMN2 Q16637 4/20 0.34
GAA P10253 2/20 0.34
MEN1 O00255 2/20 0.34
KMT2A Q03164 2/20 0.34
KDM4E B2RXH2 1/20 0.34
RECQL P46063 1/20 0.34
HSD17B10 Q99714 2/20 0.33
PKM P14618 1/20 0.33

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL704517 0.99 TSHR (0.41) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL3163304 0.92 HTT (0.35) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL701332 0.92 KMT2A (0.39) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL3159376 0.92 HTT (0.33) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL3158436 0.91 HTT (0.34) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL5972861 0.91 ALDH1A1 (0.34) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL700902 0.91 KMT2A (0.38) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL190939 0.91 SLC2A1 (0.38) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL29754149 0.91 SLC2A1 (0.38) TSHRALDH1A1LMNAHTTMCOLN3
SCHEMBL3168087 0.91 HTT (0.32) TSHRALDH1A1LMNAHTTMCOLN3

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 37 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8722306-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2014-05-13 US disclosed
US-20120164586-A1 PATERN FORMING METHOD JSR CORPORATION (JP) 2012-06-28 US disclosed
US-8124314-B2 Radiation-sensitive composition JSR CORPORATION (JP) 2012-02-28 US disclosed
US-20100221664-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-09-02 US disclosed
US-20100203452-A1 RADIATION-SENSITIVE COMPOSITION JSR CORPORATION (JP) 2010-08-12 US disclosed
US-20100178608-A1 RADIATION-SENSITIVE RESIN COMPOSITION JSR CORPORATION (JP) 2010-07-15 US disclosed
EP-1225480-B1 Radiation-sensitive resin composition JSR CORP (JP) 2010-03-17 EP disclosed
US-7531286-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2009-05-12 US disclosed
US-7510817-B2 Photoresist polymer compositions JSR CORPORATION (JP) 2009-03-31 US disclosed
US-7314701-B2 Radiation-sensitive resin composition JSR CORPORATION (JP) 2008-01-01 US disclosed
US-20040048192-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2004-03-11 US disclosed
US-20030203309-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 US disclosed
US-20030203307-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2003-10-30 US disclosed
US-20030157423-A1 Copolymer, polymer mixture, and radiation-sensitive resin composition JSR CORPORATION (JP) 2003-08-21 US disclosed
US-6482568-B1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-11-19 US disclosed
US-20020132181-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-09-19 US disclosed
EP-1225480-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-07-24 EP disclosed
US-20020058201-A1 Radiation-sensitive resin composition JSR CORPORATION (JP) 2002-05-16 US disclosed
EP-1193558-A2 Radiation-sensitive resin composition JSR Corporation (JP) 2002-04-03 EP disclosed
EP-1085379-A1 Radiation-sensitive resin composition JSR Corporation (JP) 2001-03-21 EP disclosed