SCHEMBL2975905

SCHEMBL2975905

O=C1c2ccccc2C(=O)N1OS(=O)(=O)C=Cc1ccccc1

nearest known ligand 0.54

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 7/20 0.54
MAPT P10636 7/20 0.54
ALDH1A1 P00352 6/20 0.54
KMT2A Q03164 5/20 0.54
HPGD P15428 4/20 0.54
PPARG P37231 9/20 0.51
NFE2L2 Q16236 2/20 0.51
LMNA P02545 2/20 0.51
MEN1 O00255 3/20 0.46
VDR P11473 2/20 0.46
F2 P00734 4/20 0.43
HTT P42858 3/20 0.43
XBP1 P17861 2/20 0.43
CYP1A2 P05177 1/20 0.43
CYP3A4 P08684 1/20 0.43
CYP2C19 P33261 1/20 0.43
NPSR1 Q6W5P4 1/20 0.43
SMN1; SMN2 Q16637 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL278207 0.75 PPARG (0.56) ALDH1A1KMT2APPARGNFE2L2LMNA
SCHEMBL601077 0.73 PPARG (0.68) ALDH1A1KMT2APPARGNFE2L2LMNA
SCHEMBL29217852 0.73 ALDH1A1 (0.66) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL9673487 0.72 ALDH1A1 (0.60) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL9673492 0.72 ALDH1A1 (0.60) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL64368 0.70 KDM4E (1.00) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL66141 0.70 KDM4E (0.61) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL11025467 0.70 ALDH1A1 (0.61) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL9064541 0.70 ALDH1A1 (0.61) KDM4EMAPTALDH1A1KMT2AHPGD
SCHEMBL13290905 0.70 PPARG (0.64) ALDH1A1PPARGNFE2L2LMNAHTT

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20060121390-A1 High resolution resists for next generation lithographies NATIONAL SCIENCE FOUNDATION 2006-06-08 US claimed
US-7776505-B2 High resolution resists for next generation lithographies THE UNIVERSITY OF NORTH CAROLINA AT CHARLOTTE (US) 2010-08-17 US disclosed
US-20060121390-A1 High resolution resists for next generation lithographies NATIONAL SCIENCE FOUNDATION 2006-06-08 US disclosed