Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | TSHR | P16473 | 2/20 | 0.67 |
| ▸ | GABRA1 | P14867 | 2/20 | 0.56 |
| ▸ | GABRB2 | P47870 | 2/20 | 0.56 |
| ▸ | POLB | P06746 | 2/20 | 0.49 |
| ▸ | TRPA1 | O75762 | 4/20 | 0.40 |
| ▸ | HPGD | P15428 | 4/20 | 0.38 |
| ▸ | LMNA | P02545 | 4/20 | 0.37 |
| ▸ | CA2 | P00918 | 2/20 | 0.37 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.37 |
| ▸ | BLM | P54132 | 2/20 | 0.37 |
| ▸ | HIF1A | Q16665 | 2/20 | 0.37 |
| ▸ | FAAH | O00519 | 1/20 | 0.37 |
| ▸ | CA1 | P00915 | 1/20 | 0.37 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.37 |
| ▸ | GABRB1 | P18505 | 1/20 | 0.37 |
| ▸ | GABRG2 | P18507 | 1/20 | 0.37 |
| ▸ | PTGS1 | P23219 | 1/20 | 0.37 |
| ▸ | SLC6A2 | P23975 | 1/20 | 0.37 |
| ▸ | HTR2C | P28335 | 1/20 | 0.37 |
| ▸ | GABRB3 | P28472 | 1/20 | 0.37 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9329661 | 0.85 | GABRA1 (0.58) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL9751998 | 0.85 | GABRA1 (0.58) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL9838282 | 0.84 | GABRA1 (0.54) | TSHRGABRA1GABRB2POLBHPGD | |
| Benzene SCHEMBL1836843 | 0.83 | TSHR (0.95) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL11350482 | 0.82 | TSHR (0.55) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL282162 | 0.80 | TSHR (1.00) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL15485172 | 0.80 | TSHR (1.00) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL20721726 | 0.80 | TSHR (1.00) | TSHRGABRA1GABRB2POLBTRPA1 | |
| SCHEMBL6238111 | 0.79 | TSHR (0.60) | TSHRGABRA1GABRB2POLBTRPA1 | |
| Hydrochloric Acid SCHEMBL7075092 | 0.78 | TSHR (0.95) | TSHRGABRA1GABRB2POLBHPGD |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 131 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| JP-63183918-A | — | — | None | — | — | JP | disclosed |
| JP-61065876-A | — | — | None | — | — | JP | disclosed |
| JP-61078821-A | — | — | None | — | — | JP | disclosed |
| US-11640111-B2 | Photosensitive resin composition and cured film comprising the same | LG CHEM, LTD. (KR) | 2023-05-02 | — | — | US | disclosed |
| CN-110325914-A | PHOTOSENSITIVE RESIN COMPOSITION AND CURED FILM COMPRISING SAME | 株式会社LG化学 | 2019-10-11 | — | — | CN | disclosed |
| EP-1199603-B1 | Positive photosensitive composition | FUJIFILM CORP (JP) | 2016-11-30 | — | — | EP | disclosed |
| EP-1158363-B1 | Positive resist composition and onium salts of saccharin derivatives | FUJIFILM CORP (JP) | 2014-01-22 | — | — | EP | disclosed |
| US-7812194-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-10-12 | — | — | US | disclosed |
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | FUJIFILM CORPORATION (JP) | 2010-10-07 | — | — | US | disclosed |
| US-7776512-B2 | Positive photosensitive composition | FUJIFILM CORPORATION (JP) | 2010-08-17 | — | — | US | disclosed |
| EP-0709736-A1 | Positive chemically amplified resist composition and method for producing compounds used therein | FUJI PHOTO FILM CO., LTD. (JP) | 1996-05-01 | — | — | EP | disclosed |
| EP-0706089-A2 | Process for synthesizing quinonediazide ester and positive working photoresist containing the same | FUJI PHOTO FILM CO., LTD. (JP) | 1996-04-10 | — | — | EP | disclosed |
| US-5494773-A | MIXTURE WITH A 1,2-QUINONEDIAZIDE COMPOUND | FUJI PHOTO FILM CO., LTD. (JP) | 1996-02-27 | — | — | US | disclosed |
| EP-0684521-A1 | Positive working photosensitive compositions | FUJI PHOTO FILM CO., LTD. (JP) | 1995-11-29 | — | — | EP | disclosed |
| EP-0677789-A1 | Positive photoresist composition | Fuji Photo Film Co., Ltd. (JP) | 1995-10-18 | — | — | EP | disclosed |
| EP-0672952-A1 | Positive photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-09-20 | — | — | EP | disclosed |
| EP-0658807-A1 | Positive-working photoresist composition | FUJI PHOTO FILM CO., LTD. (JP) | 1995-06-21 | — | — | EP | disclosed |
| JP-S63183918-A | EPOXY RESIN COMPOSITION | UBE IND LTD | 1988-07-29 | — | — | JP | disclosed |
| JP-S6178821-A | EPOXY RESIN COMPOSITION FOR SEMICONDUCTOR SEALING | YUKA SHELL EPOXY KK | 1986-04-22 | — | — | JP | disclosed |
| JP-S6165876-A | TRIFUNCTIONAL EPOXY COMPOUND | YUKA SHELL EPOXY KK | 1986-04-04 | — | — | JP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20100255419-A1 | POSITIVE PHOTOSENSITIVE COMPOSITION | RARA, SUN2, RARG | TSHR 4674/4885GABRA1 2757/4885GABRB2 2968/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.