⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL12199963 | 0.98 | THRB (0.31) | — | |
| SCHEMBL30360199 | 0.98 | THRB (0.31) | — | |
| SCHEMBL2568582 | 0.98 | THRB (0.31) | — | |
| SCHEMBL30360189 | 0.95 | — | — | |
| SCHEMBL29022882 | 0.90 | — | — | |
| SCHEMBL8852545 | 0.89 | MEN1 (0.32) | — | |
| SCHEMBL12199984 | 0.87 | MEN1 (0.30) | — | |
| SCHEMBL2979707 | 0.86 | — | — | |
| SCHEMBL25869995 | 0.85 | — | — | |
| SCHEMBL5889533 | 0.84 | THRB (0.32) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 39 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-115803350-B | Method for producing hollow fine particles and hollow fine particles | 大金工业株式会社 | 2025-02-25 | — | — | CN | disclosed |
| CN-115003506-B | Multilayer film and method for producing same | ＡＧＣ株式会社 | 2024-07-09 | — | — | CN | disclosed |
| US-20240059813-A1 | RADICAL POLYMERIZATION METHOD, AND METHOD FOR PRODUCING RADICAL-POLYMERIZED FLUORINE-BASED POLYMER | MITSUBISHI MATERIALS ELECTRONIC CHEMICALS CO., LTD. (JP) | 2024-02-22 | — | — | US | disclosed |
| EP-4265649-A1 | RADICAL POLYMERIZATION METHOD, AND METHOD FOR PRODUCING RADICAL-POLYMERIZED FLUORINE-BASED POLYMER | Mitsubishi Materials Electronic Chemicals Co., Ltd. (JP) | 2023-10-25 | — | — | EP | disclosed |
| EP-3483193-B1 | CURABLE COMPOSITION, METHOD FOR PRODUCING SAME, AND ARTICLE PRODUCED THEREWITH | DAIKIN IND LTD (JP) | 2023-08-23 | — | — | EP | disclosed |
| US-20230144395-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | DAIKIN INDUSTRIES, LTD. (JP) | 2023-05-11 | — | — | US | disclosed |
| EP-4166579-A1 | MANUFACTURING METHOD FOR HOLLOW FINE PARTICLES, AND HOLLOW FINE PARTICLES | Daikin Industries, Ltd. (JP) | 2023-04-19 | — | — | EP | disclosed |
| US-11630389-B2 | Curable composition for imprinting, replica mold and its production process | AGC Inc. (JP) | 2023-04-18 | — | — | US | disclosed |
| US-11623969-B2 | Method for producing water/oil repellent composition and method for producing water/oil repellent article | AGC Inc. (JP) | 2023-04-11 | — | — | US | disclosed |
| US-11572434-B2 | Curable composition, method for producing same, and article using same | DAIKIN INDUSTRIES, LTD. (JP) | 2023-02-07 | — | — | US | disclosed |
| US-20190056664-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-02-21 | — | — | US | disclosed |
| US-20190004425-A1 | METHOD OF FORMING RESIST PATTERN | ZEON CORPORATION (JP) | 2019-01-03 | — | — | US | disclosed |
| EP-3409700-A1 | POLYMER, POSITIVE RESIST COMPOSITION, AND RESIST PATTERN FORMING METHOD | Zeon Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| EP-3410209-A1 | RESIST PATTERN FORMING METHOD | Zeon Corporation (JP) | 2018-12-05 | — | — | EP | disclosed |
| CN-108473627-A | Polymer, positive corrosion-resisting agent composition and the method for forming resist pattern | 日本瑞翁株式会社 | 2018-08-31 | — | — | CN | disclosed |
| CN-108369378-A | Method of forming resist pattern | 日本瑞翁株式会社 | 2018-08-03 | — | — | CN | disclosed |
| US-20110242191-A1 | INK COMPOSITION, INKJET RECORDING METHOD AND PROCESS FOR PRODUCING MOLDED PRINTED MATERIAL | FUJIFILM CORPORATION (JP) | 2011-10-06 | — | — | US | disclosed |
| EP-1917282-B1 | REPELLENT COMPOSITION CONTAINING GRAFT COPOLYMER, GRAFT COPOLYMER AND METHOD OF PREPARING GRAFT COPOLYMER | DAIKIN IND LTD (JP) | 2010-11-03 | — | — | EP | disclosed |
| US-20090256102-A1 | FLUOROPOLYMER AND SOIL REMOVER | DAIKIN INDUSTRIES, LTD. (JP) | 2009-10-15 | — | — | US | disclosed |
| CN-101218269-A | Fluoropolymer and soil remover | DAIKIN IND LTD (JP) | 2008-07-09 | — | — | CN | disclosed |