SCHEMBL29842269

SCHEMBL29842269

CCOc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)n1-n1c(-c2ccccc2OCC)nc(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
AKT1 P31749 2/20 0.43
AKT2 P31751 2/20 0.43
GUSB P08236 1/20 0.43
GAA P10253 2/20 0.43
MGAM O43451 1/20 0.43
SI P14410 1/20 0.43
MGAM2 Q2M2H8 1/20 0.43
FABP4 P15090 2/20 0.42
FABP5 Q01469 2/20 0.42
ALDH1A1 P00352 2/20 0.42
PDE10A Q9Y233 2/20 0.42
ENPP3 O14638 1/20 0.41
ENPP1 P22413 1/20 0.41
KDM4E B2RXH2 1/20 0.41
LMNA P02545 1/20 0.41
MAPK14 Q16539 1/20 0.41
TTR P02766 1/20 0.40
NPSR1 Q6W5P4 1/20 0.40
MEN1 O00255 1/20 0.40
KMT2A Q03164 1/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL62462 1.00 AKT1 (0.43) AKT1AKT2GUSBGAAMGAM
SCHEMBL18037949 0.89 GUSB (0.40) AKT1AKT2GUSBGAAMGAM
SCHEMBL31467270 0.84 ALDH1A1 (0.59) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL6360563 0.84 ALDH1A1 (0.59) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL4257623 0.80 ENPP1 (0.38) AKT1AKT2GUSBGAAMGAM
SCHEMBL4191996 0.77 GAA (0.38) AKT1AKT2GUSBGAAMGAM
SCHEMBL29514957 0.77 GAA (0.38) AKT1AKT2GUSBGAAMGAM
SCHEMBL7918453 0.76 AKT1 (0.39) AKT1AKT2GUSBGAAMGAM
SCHEMBL28919628 0.76 KDM4E (0.49) GAAMGAMSIMGAM2ALDH1A1
SCHEMBL6362343 0.73 ADORA2A (0.42) GAAMGAMSIMGAM2PDE10A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2022174211-A1 PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MADE DUPONT ELECTRONICS, INC. (US) 2022-08-18 WO disclosed
CN-114911132-A Photosensitive composition and dry film photoresist produced therefrom 杜邦电子公司 2022-08-16 CN disclosed