SCHEMBL28919628

SCHEMBL28919628

COc1ccccc1-c1nc(-c2ccccc2)c(-c2ccccc2)n1-n1cnc(-c2ccccc2)c1-c1ccccc1

nearest known ligand 0.53

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 3/20 0.49
ALDH1A1 P00352 3/20 0.49
LMNA P02545 2/20 0.49
GAA P10253 2/20 0.49
SMN1; SMN2 Q16637 2/20 0.43
PDE10A Q9Y233 1/20 0.42
PDGFRB P09619 1/20 0.40
PDGFRA P16234 1/20 0.40
NSD3 Q9BZ95 1/20 0.40
ADORA2A P29274 1/20 0.39
ADORA1 P30542 1/20 0.39
MGAM O43451 1/20 0.39
SI P14410 1/20 0.39
MGAM2 Q2M2H8 1/20 0.39
L3MBTL1 Q9Y468 2/20 0.39
DPP4 P27487 1/20 0.39
JAK2 O60674 1/20 0.39
JAK3 P52333 1/20 0.39
NPC1 O15118 1/20 0.39
TP53 P04637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL18037949 0.88 GUSB (0.40) ALDH1A1LMNAGAAPDE10AMGAM
SCHEMBL31467270 0.87 ALDH1A1 (0.59) KDM4EALDH1A1LMNAGAASMN1; SMN2
SCHEMBL6360563 0.87 ALDH1A1 (0.59) KDM4EALDH1A1LMNAGAASMN1; SMN2
SCHEMBL4622519 0.82 HSD11B1 (0.41) KDM4EALDH1A1LMNASMN1; SMN2NSD3
SCHEMBL5201695 0.81 LMNA (0.50) KDM4EALDH1A1LMNAGAASMN1; SMN2
SCHEMBL28919625 0.81 NSD3 (0.37) KDM4EGAASMN1; SMN2NSD3ADORA2A
SCHEMBL14670716 0.77 KDM4E (0.56) KDM4EALDH1A1LMNAGAASMN1; SMN2
SCHEMBL62462 0.76 AKT1 (0.43) KDM4EALDH1A1LMNAGAAPDE10A
SCHEMBL29842269 0.76 AKT1 (0.43) KDM4EALDH1A1LMNAGAAPDE10A
SCHEMBL5574792 0.70 NSD3 (0.55) KDM4ELMNAPDE10ANSD3ADORA2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111699212-B Polyester film for dry film resist base material 三菱化学株式会社 2022-11-18 CN disclosed