Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | AKT1 | P31749 | 2/20 | 0.43 |
| ▸ | AKT2 | P31751 | 2/20 | 0.43 |
| ▸ | GUSB | P08236 | 1/20 | 0.43 |
| ▸ | GAA | P10253 | 2/20 | 0.43 |
| ▸ | MGAM | O43451 | 1/20 | 0.43 |
| ▸ | SI | P14410 | 1/20 | 0.43 |
| ▸ | MGAM2 | Q2M2H8 | 1/20 | 0.43 |
| ▸ | FABP4 | P15090 | 2/20 | 0.42 |
| ▸ | FABP5 | Q01469 | 2/20 | 0.42 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.42 |
| ▸ | PDE10A | Q9Y233 | 2/20 | 0.42 |
| ▸ | ENPP3 | O14638 | 1/20 | 0.41 |
| ▸ | ENPP1 | P22413 | 1/20 | 0.41 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.41 |
| ▸ | LMNA | P02545 | 1/20 | 0.41 |
| ▸ | MAPK14 | Q16539 | 1/20 | 0.41 |
| ▸ | TTR | P02766 | 1/20 | 0.40 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.40 |
| ▸ | MEN1 | O00255 | 1/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL29842269 | 1.00 | AKT1 (0.43) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL18037949 | 0.89 | GUSB (0.40) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL31467270 | 0.84 | ALDH1A1 (0.59) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL6360563 | 0.84 | ALDH1A1 (0.59) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL4257623 | 0.80 | ENPP1 (0.38) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL4191996 | 0.77 | GAA (0.38) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL29514957 | 0.77 | GAA (0.38) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL7918453 | 0.76 | AKT1 (0.39) | AKT1AKT2GUSBGAAMGAM | |
| SCHEMBL28919628 | 0.76 | KDM4E (0.49) | GAAMGAMSIMGAM2ALDH1A1 | |
| SCHEMBL6362343 | 0.73 | ADORA2A (0.42) | GAAMGAMSIMGAM2PDE10A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 110 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-12429769-B2 | Photosensitive composition and photoresist dry film made therefrom | DUPONT ELECTRONICS, INC. (US) | 2025-09-30 | — | — | US | disclosed |
| US-20220252980-A1 | PHOTOSENSITIVE COMPOSITION AND PHOTORESIST DRY FILM MADE THEREFROM | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2022-08-11 | — | — | US | disclosed |
| US-20160067953-A1 | Lithographic printing press and method for on-press imaging laser sensitive lithographic plate | TENG GARY GANGHUI (US) | 2016-03-10 | — | — | US | disclosed |
| US-20150177618-A1 | Method for on-press developable lithographic plate utilizing light-blocking material | TENG GARY GANGHUI (US) | 2015-06-25 | — | — | US | disclosed |
| US-8623586-B2 | Method for on-press developable lithographic plate utilizing light-blocking material | TENG GARY GANGHUI (US) | 2014-01-07 | — | — | US | disclosed |
| US-8252513-B2 | Method for on-press developing laser sensitive lithographic printing plate | TENG GARY GANGHUI (US) | 2012-08-28 | — | — | US | disclosed |
| US-20120137908-A1 | Device and method for removing overcoat of on-press developable lithographic plate | TENG GARY GANGHUI (US) | 2012-06-07 | — | — | US | disclosed |
| US-8146495-B2 | Deactivating device and method for lithographic plate | TENG GARY GANGHUI (US) | 2012-04-03 | — | — | US | disclosed |
| US-8148048-B2 | Method of processing on-press developable lithographic printing plate having overcoat | TENG GARY GANGHUI (US) | 2012-04-03 | — | — | US | disclosed |
| US-8133651-B2 | Lithographic printing plate comprising alkaline soluble and alkaline insoluble polymeric binders | TENG GARY GANGHUI (US) | 2012-03-13 | — | — | US | disclosed |
| EP-0941866-B1 | Thermally imageable element having improved room light stability | DU PONT (US) | 2003-04-16 | — | — | EP | disclosed |
| EP-0909990-B1 | Photopolymerizable compositions having improved sidewall geometry and development latitude | DU PONT (US) | 2002-10-16 | — | — | EP | disclosed |
| US-6251571-B1 | MIXTURE OF OXIDIZER, DYE AND HYDROXYLAMINE | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-06-26 | — | — | US | disclosed |
| US-6180319-B1 | APPLYING AQUEOUS-DEVELOPABLE PHOTORESIST COMPRISING PHOTOINITIATOR TO SURFACE OF SUBSTRATE; IMAGEWISE EXPOSING TO ACTINIC RADIATION TO PRODUCE EXPOSED AND NON-EXPOSED AREAS IN PHOTORESIST; TREATING WITH SAMPLE OF ALKALINE SOLUTION | E. I. DU PONT DE NEMOURS AND COMPANY | 2001-01-30 | — | — | US | disclosed |
| US-5962190-A | BINDER OF C4-10 ALKYL METHACRYLATE, C4-10 ALKYL ACRYLATE, METHYL METHACRYLATE OR ETHYL METHACRYLATE, METHACRYLIC ACID OR ACRYLIC ACID, AND STYRENE; UNSATURATED CROSSLINKING AGENT; PHOTOINITIATOR; RELIEF IMAGES | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-10-05 | — | — | US | disclosed |
| EP-0941866-A1 | Non-photosensitive, thermally imageable element having improved room light stability | E. I. du Pont de Nemours and Company (US) | 1999-09-15 | — | — | EP | disclosed |
| EP-0909990-A2 | Photopolymerizable compositions having improved sidewall geometry and development latitude | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-04-21 | — | — | EP | disclosed |
| US-5858583-A | ELEMENT COMPRISING SUPPORT AND THERMALLY IMAGEABLE COMPOSITION COMPRISING HEXAARYLBIIMIDAZOLE COMPOUND, LEUCO DYE, ACID-GENERATING COMPOUND, POLYMERIC BINDER, NEAR INFRARED ABSORBING DYE | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1999-01-12 | — | — | US | disclosed |
| US-5744280-A | MONOCHROME IMAGES;IMPROVED CONTRAST | E. I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-04-28 | — | — | US | disclosed |
| EP-0828182-A1 | Storage-stable photoimageable compositions with improved leuco dye | E.I. DU PONT DE NEMOURS AND COMPANY (US) | 1998-03-11 | — | — | EP | disclosed |