SCHEMBL29863040

SCHEMBL29863040

Cc1cccc(CN2CCCNCC2)c1

nearest known ligand 0.64

Predicted protein targets (top 18)

geneUniProtsupporting neighboursconfidence
CXCR4 P61073 10/20 0.64
HRH3 Q9Y5N1 2/20 0.59
MEN1 O00255 2/20 0.59
KMT2A Q03164 2/20 0.59
CHRM2 P08172 1/20 0.59
CHRM1 P11229 1/20 0.59
ADRA2C P18825 1/20 0.59
CCR2 P41597 1/20 0.59
CXCL12 P48061 1/20 0.59
BLM P54132 1/20 0.59
TDP1 Q9NUW8 1/20 0.59
SIGMAR1 Q99720 1/20 0.56
CHRM3 P20309 1/20 0.54
POLB P06746 1/20 0.52
ALDH1A1 P00352 2/20 0.51
KDM4E B2RXH2 1/20 0.51
MAPT P10636 1/20 0.51
HTT P42858 1/20 0.50

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28849168 1.00 CXCR4 (0.64) CXCR4HRH3MEN1KMT2ACHRM2
SCHEMBL29756483 0.94 SIGMAR1 (0.62) CXCR4HRH3MEN1KMT2ASIGMAR1
SCHEMBL593734 0.94 SIGMAR1 (0.62) CXCR4HRH3MEN1KMT2ASIGMAR1
Hydrochloric Acid SCHEMBL2923966 0.92 SIGMAR1 (0.61) CXCR4MEN1KMT2ASIGMAR1CHRM3
SCHEMBL30135313 0.90 HRH3 (0.52) CXCR4HRH3MEN1KMT2ACHRM2
SCHEMBL674945 0.86 CXCR4 (0.75) CXCR4HRH3MEN1KMT2ACHRM2
SCHEMBL17308185 0.86 MEN1 (0.56) HRH3MEN1KMT2ASIGMAR1CHRM3
SCHEMBL12981 0.85 HRH3 (0.69) HRH3TDP1ALDH1A1KDM4EMAPT
SCHEMBL31546411 0.85 HRH3 (0.69) HRH3TDP1ALDH1A1KDM4EMAPT
SCHEMBL17929341 0.84 CXCR4 (0.72) CXCR4HRH3MEN1KMT2ACHRM2

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN claimed
CN-115093794-B Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2023-10-13 CN disclosed
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN disclosed