SCHEMBL29863134

SCHEMBL29863134

Cc1ccccc1CN1CCCNCC1

nearest known ligand 0.84

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LMNA P02545 2/20 0.84
KMT2A Q03164 4/20 0.58
CYP2A13 Q16696 1/20 0.57
ACHE P22303 1/20 0.55
CXCR4 P61073 9/20 0.55
MEN1 O00255 3/20 0.54
CHRM2 P08172 1/20 0.54
CHRM1 P11229 1/20 0.54
ADRA2C P18825 1/20 0.54
CCR2 P41597 1/20 0.54
CXCL12 P48061 1/20 0.54
BLM P54132 1/20 0.54
TDP1 Q9NUW8 1/20 0.54
HRH3 Q9Y5N1 1/20 0.54
MAPT P10636 1/20 0.54
SIGMAR1 Q99720 1/20 0.50
KDM4E B2RXH2 2/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
ALDH1A1 P00352 1/20 0.48
SLC6A2 P23975 1/20 0.48

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL14818737 1.00 LMNA (0.84) LMNAKMT2ACYP2A13ACHECXCR4
SCHEMBL593284 0.93 LMNA (0.96) LMNAKMT2ACYP2A13ACHEMEN1
Hydrochloric Acid SCHEMBL7417639 0.92 LMNA (1.00) LMNAKMT2ACYP2A13ACHEMEN1
Hydrochloric Acid SCHEMBL2924720 0.92 LMNA (1.00) LMNAKMT2ACYP2A13ACHEMEN1
SCHEMBL30135292 0.89 LMNA (0.68) LMNAKMT2ACYP2A13ACHECXCR4
SCHEMBL329437 0.84 KMT2A (0.72) LMNAKMT2ACYP2A13ACHEMEN1
SCHEMBL15966079 0.84 LMNA (0.59) LMNAKMT2ACXCR4MEN1CHRM2
Hydrochloric Acid SCHEMBL23850614 0.83 LMNA (0.71) LMNAKMT2ACYP2A13ACHEMEN1
SCHEMBL1164984 0.83 KMT2A (0.70) LMNAKMT2ACYP2A13ACHEMEN1
SCHEMBL12856255 0.83 KMT2A (0.76) LMNAKMT2ACYP2A13ACHEMEN1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-115093794-B Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2023-10-13 CN claimed
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN claimed
CN-115093794-B Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2023-10-13 CN disclosed
CN-115093794-A Polysilicon polishing composition and application thereof 万华化学集团电子材料有限公司 2022-09-23 CN disclosed