Methacrylic Acid

Methacrylic Acid

SCHEMBL2989771

C=C(C)C(=O)O.C=C(C)C(=O)O.C=C(C)C(=O)O.CCOC(C)C(CO)(CO)CO

nearest known ligand 0.32

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Predicted protein targets (top 5)

geneUniProtsupporting neighboursconfidence
TSHR P16473 1/20 0.32
ALDH1A1 P00352 1/20 0.31
TDP1 Q9NUW8 1/20 0.31
THRB P10828 1/20 0.31
TGFBR1 P36897 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetic Acid SCHEMBL29779174 0.89 ALDH1A1 (0.36) ALDH1A1TDP1
Methacrylic Acid SCHEMBL28971892 0.86 TSHR (0.32) TSHR
Methacrylic Acid SCHEMBL9453569 0.85
SCHEMBL30927822 0.84 ALDH1A1 (0.30) ALDH1A1TDP1
SCHEMBL1123576 0.82 LMNA (0.41) THRB
Acrylic Acid SCHEMBL31059854 0.82 LMNA (0.36) TSHRALDH1A1
Acrylic Acid SCHEMBL29282689 0.82 LMNA (0.36) TSHRALDH1A1
Acrylic Acid SCHEMBL27994511 0.82 LMNA (0.36) TSHRALDH1A1
Acrylic Acid SCHEMBL31059850 0.82 LMNA (0.36) TSHRALDH1A1
Methacrylic Acid SCHEMBL9704882 0.81 TSHR (0.34) TSHRALDH1A1TGFBR1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-113683972-B Explosion-proof adhesive tape and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2023-04-14 CN claimed
CN-113683972-A Explosion-proof adhesive tape and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2021-11-23 CN claimed
CN-113549241-A Polymer foaming microsphere and preparation method thereof 南京工业大学 2021-10-26 CN claimed
CN-108630866-B Hydrophilic perfluoro battery diaphragm and preparation method thereof 苏州名列膜材料有限公司 2021-03-19 CN claimed
CN-112430328-A Photocuring organic silicon resin cross-linking agent and synthesis method and application thereof 肇庆市武大环境技术研究院 2021-03-02 CN claimed
CN-109835081-A A kind of double coating water developments exempt from processing CTP editions 安徽强邦印刷材料有限公司 2019-06-04 CN claimed
CN-109839803-A A kind of heat susceptible coating for exempting from processing CTP editions suitable for water development 安徽强邦印刷材料有限公司 2019-06-04 CN claimed
CN-106364209-B Thermosensitive treatment-free lithographic printing plate material containing thermosensitive protective layer and application 中国科学院理化技术研究所 2018-11-09 CN claimed
CN-106893534-A For road sign reflective membrane hot soarfing from pressure sensitive adhesive and preparation method thereof 浙江龙游道明光学有限公司 2017-06-27 CN claimed
CN-106364209-A Thermosensitive treatment-free lithographic printing plate material containing thermosensitive protective layer and application 中国科学院理化技术研究所 2017-02-01 CN claimed
CN-104714365-A Photosensitive composition and photoresist GUANGDONG DANBOND TECHNOLOGY CO LTD 2015-06-17 CN claimed
CN-119667831-A High-temperature deformation warp resistant brightness enhancement film 宁波激智科技股份有限公司 2025-03-21 CN disclosed
CN-117832370-A Laminate for MIP encapsulation, preparation method, encapsulation structure and preparation method 杭州福斯特电子材料有限公司 2024-04-05 CN disclosed
CN-117096427-A Gel electrolyte and battery comprising same 珠海冠宇电池股份有限公司 2023-11-21 CN disclosed
CN-113683972-B Explosion-proof adhesive tape and preparation method and application thereof 苏州赛伍应用技术股份有限公司 2023-04-14 CN disclosed
CN-103930472-B A kind of plasma of producing by electron beam irradiation and by gas and uv-radiation are cured the method for composition IDEON LLC (US) 2016-01-06 CN disclosed
CN-104714365-A Photosensitive composition and photoresist GUANGDONG DANBOND TECHNOLOGY CO LTD 2015-06-17 CN disclosed
CN-103930472-A A process for curing a composition by electron beam radiation, and by gas-generated plasma and ultraviolet radiation IDEON LLC 2014-07-16 CN disclosed
US-20100009266-A1 ION-CONDUCTIVE POLYMER ELECTROLYTE AND SECONDARY BATTERY EMPLOYING THE SAME NOF CORPORATION (JP) 2010-01-14 US disclosed
EP-2073301-A1 ION CONDUCTING POLYMER ELECTROLYTE AND SECONDARY BATTERY USING THE SAME NOF Corporation (JP) 2009-06-24 EP disclosed