SCHEMBL29902877

SCHEMBL29902877

NC(N)(c1ccccc1)c1cccc(C(=O)O)c1C(=O)O

nearest known ligand 0.46

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX15 P16050 2/20 0.46
LMNA P02545 1/20 0.46
ALDH1A1 P00352 6/20 0.45
AKR1C3 P42330 1/20 0.41
KMT2A Q03164 3/20 0.40
NR4A1 P22736 1/20 0.40
NR4A2 P43354 1/20 0.40
NR4A3 Q92570 1/20 0.40
MYC P01106 1/20 0.40
CDC25B P30305 1/20 0.40
HPGD P15428 2/20 0.39
KDM4E B2RXH2 1/20 0.39
CA12 O43570 1/20 0.39
CA1 P00915 1/20 0.39
CA2 P00918 1/20 0.39
HMGB1 P09429 1/20 0.39
CA4 P22748 1/20 0.39
CA6 P23280 1/20 0.39
CA7 P43166 1/20 0.39
SMN1; SMN2 Q16637 1/20 0.39

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL28347889 1.00 ALOX15 (0.46) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL9308271 0.82 ALDH1A1 (0.45) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL28604177 0.81 ALDH1A1 (0.43) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL3650475 0.81 ALDH1A1 (0.43) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL7147467 0.78 KMT2A (0.41) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL8625772 0.78 ALDH1A1 (0.41) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL11540498 0.78 ALDH1A1 (0.41) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL28916485 0.76 ALOX15 (0.40) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL30085338 0.76 ALOX15 (0.40) ALOX15LMNAALDH1A1AKR1C3KMT2A
SCHEMBL1355526 0.76 ALOX15 (0.47) ALOX15LMNAALDH1A1AKR1C3KMT2A

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119654696-A Method for manufacturing substrate laminate and semiconductor device 三井化学株式会社 2025-03-18 CN disclosed
US-20240384132-A1 COMPOSITION FOR FORMING FILM FOR SEMICONDUCTOR, LAMINATE, AND SUBSTRATE LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-11-21 US disclosed
US-20240371713-A1 COMPOSITION FOR FORMING FILM FOR SEMICONDUCTOR, LAMINATE, AND SUBSTRATE LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-11-07 US disclosed
EP-4391025-A1 COMPOSITION FOR FORMING FILM FOR SEMICONDUCTOR, LAMINATE, AND SUBSTRATE LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-06-26 EP disclosed
EP-4391024-A1 COMPOSITION FOR FORMING FILM FOR SEMICONDUCTOR, LAMINATE, AND SUBSTRATE LAMINATE MITSUI CHEMICALS, INC. (JP) 2024-06-26 EP disclosed
US-11487205-B2 Semiconductor element intermediate, composition for forming metal-containing film, method of producing semiconductor element intermediate, and method of producing semiconductor element MITSUI CHEMICALS, INC. (JP) 2022-11-01 US disclosed