SCHEMBL29911581

SCHEMBL29911581

CCCCOc1ccc2c(OCCCC)ccc([S+]3CCCC3)c2c1

nearest known ligand 0.37

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 2/20 0.36
CYP2C9 P11712 2/20 0.36
CYP2C19 P33261 2/20 0.36
HTR1B P28222 6/20 0.34
KDM4E B2RXH2 3/20 0.34
MAPT P10636 3/20 0.34
ALDH1A1 P00352 2/20 0.34
LMNA P02545 1/20 0.34
NPSR1 Q6W5P4 1/20 0.34
CNR1 P21554 1/20 0.34
CNR2 P34972 1/20 0.34
PTGES O14684 1/20 0.34
ALOX5 P09917 1/20 0.34
TSHR P16473 2/20 0.34
LTA4H P09960 1/20 0.34
HTR1A P08908 5/20 0.34
HTR1D P28221 5/20 0.34
MAPK1 P28482 2/20 0.34
HPGD P15428 1/20 0.34
HSD17B10 Q99714 1/20 0.34

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1534204 1.00 CYP1A2 (0.36) CYP1A2CYP2C9CYP2C19HTR1BKDM4E
SCHEMBL19469357 0.91 PTGES (0.32) KDM4EMAPTALDH1A1LMNANPSR1
Trifluoromethanesulfonic Acid SCHEMBL29491013 0.88 ACHE (0.35) LMNAPTGESALOX5TSHRMAPK1
Trifluoromethanesulfonic Acid SCHEMBL1057942 0.88 ACHE (0.35) LMNAPTGESALOX5TSHRMAPK1
SCHEMBL30019394 0.86 MAOB (0.33) LMNAPTGESALOX5TSHRMAPK1
SCHEMBL106524 0.85 CNR1 (0.45) CYP1A2CYP2C9CYP2C19HTR1BCNR1
SCHEMBL29429149 0.85 CNR1 (0.45) CYP1A2CYP2C9CYP2C19HTR1BCNR1
Bromide SCHEMBL2194103 0.83 CNR1 (0.44) CYP1A2CYP2C9CYP2C19HTR1BCNR1
Hydrochloric Acid SCHEMBL31108778 0.83 CNR1 (0.44) CYP1A2CYP2C9CYP2C19HTR1BCNR1
SCHEMBL29491014 0.83 TSHR (0.34) LMNAPTGESALOX5TSHRMAPK1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-112534353-B Photosensitive resin composition, method for forming resist pattern, method for producing plated molded article, and semiconductor device JSR株式会社 2024-12-24 CN disclosed
CN-118511127-A Photosensitive resin composition, method for producing resist pattern film, and method for producing plating molded article JSR株式会社 2024-08-16 CN disclosed
CN-117296144-A Method for manufacturing semiconductor device and semiconductor device 株式会社力森诺科 2023-12-26 CN disclosed
CN-116982004-A Photosensitive composition JSR株式会社 2023-10-31 CN disclosed
CN-110073476-B Thin film transistor substrate having protective film and method for manufacturing the same 默克专利有限公司 2023-09-01 CN disclosed
CN-108700814-B Low-temperature curable negative photosensitive composition AZ电子材料(卢森堡)有限公司 2022-10-11 CN disclosed