SCHEMBL2992329

SCHEMBL2992329

Cc1cc(N)ccc1Oc1ccc(Oc2ccc(N)cc2C)cc1

nearest known ligand 0.52

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 11/20 0.52
SMN1; SMN2 Q16637 5/20 0.52
TEAD4 Q15561 1/20 0.50
MAPT P10636 6/20 0.48
TDP1 Q9NUW8 2/20 0.48
POLB P06746 1/20 0.48
CYP3A4 P08684 1/20 0.48
TSHR P16473 1/20 0.48
PDE10A Q9Y233 1/20 0.45
MEN1 O00255 4/20 0.44
KMT2A Q03164 4/20 0.44
KDM4E B2RXH2 2/20 0.44
LMNA P02545 1/20 0.44
THRB P10828 1/20 0.44
ALOX15 P16050 1/20 0.44
MITF O75030 1/20 0.43
GAA P10253 1/20 0.43
GFER P55789 1/20 0.43
NLRP1 Q9C000 1/20 0.43
NOD2 Q9HC29 1/20 0.43

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31457276 0.98 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL1155719 0.98 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL3003478 0.98 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL29688467 0.98 ALDH1A1 (0.55) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL30026906 0.94 TEAD4 (0.61) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL2989217 0.94 ALDH1A1 (0.47) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL5554646 0.94 TEAD4 (0.61) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL5549511 0.92 TDP1 (0.54) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL29764012 0.91 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1
SCHEMBL23850 0.91 ALDH1A1 (0.50) ALDH1A1SMN1; SMN2TEAD4MAPTTDP1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 38 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116854967-A High-temperature energy storage fluorine-containing aromatic polyamide dielectric film and preparation method thereof 四川大学 2023-10-10 CN claimed
CN-114479076-B Low-dielectric polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-09-19 CN claimed
CN-113968970-B Polyimide film with low thermal expansion coefficient and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-07-07 CN claimed
US-5344986-A Intermediates for polymers BROMINE COMPOUNDS, LTD. (IL) 1994-09-06 US claimed
EP-0587697-A1 LIGHT-ABSORBING POLYMERS. EASTMAN KODAK CO (US) 1994-03-23 EP claimed
WO-1992021725-A1 LIGHT-ABSORBING POLYMERS EASTMAN KODAK COMPANY (US) 1992-12-10 WO claimed
US-11885694-B2 Temperature sensor element SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2024-01-30 US disclosed
CN-114479074-B High-temperature-resistant transparent polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-12-19 CN disclosed
CN-113943419-B High-temperature-resistant low-CTE polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-11-07 CN disclosed
CN-116854967-A High-temperature energy storage fluorine-containing aromatic polyamide dielectric film and preparation method thereof 四川大学 2023-10-10 CN disclosed
CN-114479076-B Low-dielectric polyimide film and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-09-19 CN disclosed
CN-113968970-B Polyimide film with low thermal expansion coefficient and preparation method and application thereof 浙江中科玖源新材料有限公司 2023-07-07 CN disclosed
US-11674920-B2 Moisture-sensitive film and sensor using same SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-06-13 US disclosed
EP-2147766-B1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL CO (JP) 2012-08-01 EP disclosed
US-20100187719-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) 2010-07-29 US disclosed
EP-2147766-A1 PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM Mitsubishi Gas Chemical Company, Inc. (JP) 2010-01-27 EP disclosed
WO-2009045537-A1 POLY(ARYLETHERIMIDES) FOR NEGATIVE BIREFRINGENT FILMS FOR LCDS AKRON POLYMER SYSTEMS (US) 2009-04-09 WO disclosed
WO-2007011911-A2 POLY(ARYLETHERIMIDES) FOR NEGATIVE BIREFRINGENT FILMS FOR LCDS AKRON POLYMER SYSTEMS (US) 2007-01-25 WO disclosed
EP-0587697-A1 LIGHT-ABSORBING POLYMERS. EASTMAN KODAK CO (US) 1994-03-23 EP disclosed
WO-1992021725-A1 LIGHT-ABSORBING POLYMERS EASTMAN KODAK COMPANY (US) 1992-12-10 WO disclosed