Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 8/20 | 0.47 |
| ▸ | SMN1; SMN2 | Q16637 | 4/20 | 0.47 |
| ▸ | TEAD4 | Q15561 | 1/20 | 0.45 |
| ▸ | HPGD | P15428 | 2/20 | 0.45 |
| ▸ | CYP1A2 | P05177 | 1/20 | 0.45 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.45 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.45 |
| ▸ | MAPT | P10636 | 4/20 | 0.44 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.44 |
| ▸ | POLB | P06746 | 1/20 | 0.44 |
| ▸ | CYP3A4 | P08684 | 1/20 | 0.43 |
| ▸ | TSHR | P16473 | 1/20 | 0.43 |
| ▸ | PDE10A | Q9Y233 | 1/20 | 0.41 |
| ▸ | NCOA1 | Q15788 | 1/20 | 0.41 |
| ▸ | NCOA3 | Q9Y6Q9 | 1/20 | 0.41 |
| ▸ | MEN1 | O00255 | 3/20 | 0.40 |
| ▸ | KMT2A | Q03164 | 3/20 | 0.40 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.40 |
| ▸ | LMNA | P02545 | 1/20 | 0.40 |
| ▸ | THRB | P10828 | 1/20 | 0.40 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2992329 | 0.94 | ALDH1A1 (0.52) | ALDH1A1SMN1; SMN2TEAD4HPGDCYP1A2 | |
| SCHEMBL3003478 | 0.92 | ALDH1A1 (0.55) | ALDH1A1SMN1; SMN2TEAD4HPGDMAPT | |
| SCHEMBL1155719 | 0.92 | ALDH1A1 (0.55) | ALDH1A1SMN1; SMN2TEAD4HPGDMAPT | |
| SCHEMBL31457276 | 0.92 | ALDH1A1 (0.55) | ALDH1A1SMN1; SMN2TEAD4HPGDMAPT | |
| SCHEMBL29688467 | 0.92 | ALDH1A1 (0.55) | ALDH1A1SMN1; SMN2TEAD4HPGDMAPT | |
| SCHEMBL14626482 | 0.92 | ESR2 (0.43) | ALDH1A1SMN1; SMN2TEAD4HPGDCYP1A2 | |
| SCHEMBL8915293 | 0.89 | ALDH1A1 (0.53) | ALDH1A1SMN1; SMN2TEAD4HPGDCYP1A2 | |
| SCHEMBL8020707 | 0.89 | ALDH1A1 (0.52) | ALDH1A1SMN1; SMN2TEAD4HPGDCYP1A2 | |
| SCHEMBL5554646 | 0.89 | TEAD4 (0.61) | ALDH1A1SMN1; SMN2TEAD4MAPTTDP1 | |
| SCHEMBL30026906 | 0.89 | TEAD4 (0.61) | ALDH1A1SMN1; SMN2TEAD4MAPTTDP1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 34 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-114479076-B | Low-dielectric polyimide film and preparation method and application thereof | 浙江中科玖源新材料有限公司 | 2023-09-19 | — | — | CN | claimed |
| CN-113968970-B | Polyimide film with low thermal expansion coefficient and preparation method and application thereof | 浙江中科玖源新材料有限公司 | 2023-07-07 | — | — | CN | claimed |
| US-5344986-A | Intermediates for polymers | BROMINE COMPOUNDS, LTD. (IL) | 1994-09-06 | — | — | US | claimed |
| US-11885694-B2 | Temperature sensor element | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2024-01-30 | — | — | US | disclosed |
| CN-113943419-B | High-temperature-resistant low-CTE polyimide film and preparation method and application thereof | 浙江中科玖源新材料有限公司 | 2023-11-07 | — | — | CN | disclosed |
| CN-114479076-B | Low-dielectric polyimide film and preparation method and application thereof | 浙江中科玖源新材料有限公司 | 2023-09-19 | — | — | CN | disclosed |
| CN-113968970-B | Polyimide film with low thermal expansion coefficient and preparation method and application thereof | 浙江中科玖源新材料有限公司 | 2023-07-07 | — | — | CN | disclosed |
| US-11674920-B2 | Moisture-sensitive film and sensor using same | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-06-13 | — | — | US | disclosed |
| CN-111133032-B | Polyimide, polyimide varnish, and polyimide film | 三菱瓦斯化学株式会社 | 2022-07-19 | — | — | CN | disclosed |
| CN-111051384-B | Polyimide, polyimide varnish, and polyimide film | 三菱瓦斯化学株式会社 | 2022-06-28 | — | — | CN | disclosed |
| CN-111073283-B | Cross-linked polyimide film, optical film and preparation method thereof | 李南文 | 2022-05-31 | — | — | CN | disclosed |
| EP-3489284-A1 | POLYIMIDE RESIN FILM AND METHOD FOR PRODUCING POLYIMIDE RESIN FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2019-05-29 | — | — | EP | disclosed |
| US-9193850-B2 | Nanocomposite, process for preparing the same, and surface emitting device | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2015-11-24 | — | — | US | disclosed |
| US-20130037786-A1 | NANOCOMPOSITE, PROCESS FOR PREPARING THE SAME, AND SURFACE EMITTING DEVICE | SAMSUNG ELECTRONICS CO., LTD. (KR) | 2013-02-14 | — | — | US | disclosed |
| US-8357322-B2 | Process and apparatus for production of colorless transparent resin film | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2013-01-22 | — | — | US | disclosed |
| EP-2147766-B1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL CO (JP) | 2012-08-01 | — | — | EP | disclosed |
| US-20100187719-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | MITSUBISHI GAS CHEMICAL COMPANY, INC. (JP) | 2010-07-29 | — | — | US | disclosed |
| EP-2147766-A1 | PROCESS AND APPARATUS FOR PRODUCTION OF COLORLESS TRANSPARENT RESIN FILM | Mitsubishi Gas Chemical Company, Inc. (JP) | 2010-01-27 | — | — | EP | disclosed |
| WO-2009045537-A1 | POLY(ARYLETHERIMIDES) FOR NEGATIVE BIREFRINGENT FILMS FOR LCDS | AKRON POLYMER SYSTEMS (US) | 2009-04-09 | — | — | WO | disclosed |
| WO-2007011911-A2 | POLY(ARYLETHERIMIDES) FOR NEGATIVE BIREFRINGENT FILMS FOR LCDS | AKRON POLYMER SYSTEMS (US) | 2007-01-25 | — | — | WO | disclosed |