SCHEMBL29959532

SCHEMBL29959532

C=Cc1onc2ccccc12

nearest known ligand 0.36

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
GPR3 P46089 1/20 0.36
PIK3CA P42336 1/20 0.34
ALDH1A1 P00352 6/20 0.33
MEN1 O00255 2/20 0.33
KMT2A Q03164 2/20 0.33
KDM4E B2RXH2 2/20 0.33
NPC1 O15118 1/20 0.33
POLB P06746 1/20 0.33
SMN1; SMN2 Q16637 3/20 0.33
HPGD P15428 2/20 0.33
IP6K1 Q92551 2/20 0.32
RAB9A P51151 2/20 0.32
GAA P10253 1/20 0.32
MAPT P10636 1/20 0.32
HSD17B10 Q99714 4/20 0.31
MAOA P21397 2/20 0.31
GLA P06280 1/20 0.31
CHRM2 P08172 1/20 0.31
ADRA2A P08913 1/20 0.31
ADORA3 P0DMS8 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL7382697 0.79 ALDH1A1 (0.44) GPR3PIK3CAALDH1A1MEN1KMT2A
SCHEMBL3816281 0.71 GPR3 (0.40) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL5276597 0.71 GPR3 (0.40) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL31001160 0.70 ALDH1A1 (0.46) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL1423001 0.67 GPR3 (0.46) GPR3ALDH1A1MEN1KMT2ASMN1; SMN2
SCHEMBL16118411 0.67 GPR3 (0.40) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL7217441 0.67 MAOA (0.44) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL2484093 0.67 GPR3 (0.40) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL1013979 0.67 ALDH1A1 (0.44) GPR3ALDH1A1MEN1KMT2AKDM4E
SCHEMBL2494366 0.67 CYP1A2 (0.43) GPR3ALDH1A1MEN1KMT2AKDM4E

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12312489-B2 Curable composition, cured product and method for forming insulating film TOKYO OHKA KOGYO CO., LTD. (JP) 2025-05-27 US disclosed
US-20240027889-A1 METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS TOKYO OHKA KOGYO CO., LTD. (JP) 2024-01-25 US disclosed
EP-4257644-A1 METAL OXIDE FILM-FORMING COMPOSITION, METHOD FOR PRODUCING METAL OXIDE FILMS USING SAME, AND METHOD FOR REDUCING VOLUME SHRINKAGE RATIO OF METAL OXIDE FILMS TOKYO OHKA KOGYO CO., LTD. (JP) 2023-10-11 EP disclosed
WO-2022236548-A1 STAR POLYMER, COATING MATERIAL, COATING FILM, AND METHOD FOR PRODUCING STAR POLYMER DIC CORPORATION (JP) 2022-11-17 WO disclosed
US-20220289889-A1 CURABLE COMPOSITION, CURED PRODUCT AND METHOD FOR FORMING INSULATING FILM TOKYO OHKA KOGYO CO., LTD. (JP) 2022-09-15 US disclosed