SCHEMBL29965723

SCHEMBL29965723

O=S(=O)(c1cc(O)cc2ccccc12)S(=O)(=O)c1cc(O)cc2ccccc12

nearest known ligand 0.55

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
NQO2 P16083 1/20 0.55
ALDH1A1 P00352 3/20 0.48
KDM4E B2RXH2 2/20 0.48
MEN1 O00255 2/20 0.48
HPGD P15428 2/20 0.48
KMT2A Q03164 2/20 0.48
MAPT P10636 1/20 0.48
MPI P34949 1/20 0.48
CDC25B P30305 3/20 0.45
F2 P00734 2/20 0.43
PRSS1 P07477 2/20 0.43
PRSS2 P07478 2/20 0.43
PRSS3 P35030 2/20 0.43
CA1 P00915 1/20 0.42
CA2 P00918 1/20 0.42
CA9 Q16790 1/20 0.42
TRPM4 Q8TD43 1/20 0.42
ALPL P05186 1/20 0.41
ALPI P09923 1/20 0.41
ALPG P10696 1/20 0.41

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL547642 1.00 NQO2 (0.55) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL669147 0.88 NQO2 (0.55) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL7859087 0.86 NQO2 (0.53) NQO2ALDH1A1KDM4EMEN1HPGD
Ammonia Solution, Strong SCHEMBL7523204 0.86 NQO2 (0.53) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL29469876 0.85 NQO2 (0.62) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL10817165 0.85 NQO2 (0.62) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL7859084 0.83 NQO2 (0.50) NQO2ALDH1A1KDM4EMEN1HPGD
SCHEMBL8912145 0.77 GAA (0.52) NQO2ALDH1A1KDM4EL3MBTL1
SCHEMBL27464496 0.77 ALDH1A1 (0.44) NQO2ALDH1A1KDM4EMEN1HPGD
Sulfuric Acid SCHEMBL10415586 0.76 NQO2 (0.80) NQO2ALDH1A1KDM4EMEN1HPGD

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 5 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-119452307-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2025-02-14 CN disclosed
CN-119422108-A Resist composition and method for forming resist film using same 三菱瓦斯化学株式会社 2025-02-11 CN disclosed
CN-117769684-A Resist auxiliary film composition and pattern forming method using the same 三菱瓦斯化学株式会社 2024-03-26 CN disclosed
CN-117716290-A Resist composition and method for forming resist film using the same 三菱瓦斯化学株式会社 2024-03-15 CN disclosed
CN-115151863-A Resist composition and method of using the same 三菱瓦斯化学株式会社 2022-10-04 CN disclosed