SCHEMBL29975451

SCHEMBL29975451

Oc1c2c(c3ccccc3c1O)O2

nearest known ligand 0.39

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
KDM4E B2RXH2 5/20 0.39
MAPT P10636 4/20 0.39
MEN1 O00255 4/20 0.39
KMT2A Q03164 4/20 0.39
ALDH1A1 P00352 2/20 0.39
CACNA1B Q00975 2/20 0.39
APBA1 Q02410 2/20 0.39
GAA P10253 1/20 0.39
IDO1 P14902 1/20 0.38
THRB P10828 2/20 0.37
LMNA P02545 2/20 0.37
POLB P06746 2/20 0.37
MCL1 Q07820 2/20 0.37
NPC1 O15118 1/20 0.37
RECQL P46063 1/20 0.37
RAB9A P51151 1/20 0.37
BLM P54132 1/20 0.37
TDP1 Q9NUW8 1/20 0.37
L3MBTL1 Q9Y468 1/20 0.37
PADI4 Q9UM07 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL6804727 1.00 KDM4E (0.39) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL29658219 0.79 KDM4E (0.40) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL5555424 0.78 GPR84 (0.41) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL7984547 0.75 HSD17B10 (0.55) KDM4EMAPTALDH1A1TDP1L3MBTL1
SCHEMBL29648165 0.74 IDO1 (0.53) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL30503415 0.74 PADI4 (0.55) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL888293 0.74 PADI4 (0.55) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL27740 0.74 IDO1 (0.53) KDM4EMAPTMEN1KMT2AALDH1A1
SCHEMBL9735627 0.73 CYP2D6 (0.45) KDM4EMEN1KMT2ALMNAPOLB
SCHEMBL9735632 0.73 CYP2D6 (0.41) KDM4EMAPTMEN1KMT2AALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-121586750-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2026-02-27 CN disclosed
WO-2025041813-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ASSEMBLY 日産化学株式会社 2025-02-27 WO disclosed
US-20240302744-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION NISSAN CHEMICAL CORPORATION (JP) 2024-09-12 US disclosed
CN-117063129-A Composition for forming silicon-containing underlayer film for directional self-assembly 日产化学株式会社 2023-11-14 CN disclosed
US-11674053-B2 Composition for forming underlayer film of self-assembled film including aliphatic polycyclic structure NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2023-06-13 US disclosed
WO-2022210960-A1 COMPOSITION FOR FORMING SILICON-CONTAINING UNDERLAYER FILM FOR INDUCED SELF-ORGANIZATION 日産化学株式会社 2022-10-06 WO disclosed