SCHEMBL3002862

SCHEMBL3002862

SCCCC(S)CCCC(S)CCCS

nearest known ligand 0.43

Predicted protein targets (top 2)

geneUniProtsupporting neighboursconfidence
ENPEP Q07075 1/20 0.43
FOLH1 Q04609 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL8991880 0.90
SCHEMBL28897606 0.86 ENPEP (0.30) ENPEP
SCHEMBL8991827 0.86 ENPEP (0.30) ENPEP
SCHEMBL9564862 0.83 FOLH1 (0.38) ENPEPFOLH1
SCHEMBL4077475 0.82
SCHEMBL28427628 0.82 DNM1 (0.38) ENPEP
SCHEMBL29599534 0.80 FOLH1 (0.33) ENPEPFOLH1
SCHEMBL29678187 0.80 ENPEP (0.35) ENPEP
SCHEMBL13063088 0.80 ENPEP (0.35) ENPEP
SCHEMBL5960424 0.80 OPRM1 (0.40) ENPEP

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 35 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-0334051-B1 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KK (JP) 1996-05-01 EP claimed
US-5206092-A Irradiating a composition of polyolefin resin, dimethylsiloxane and a polyfunctional compound having unsaturation or thiol groups SHOWA DENKO K.K. (JP) 1993-04-27 US claimed
CN-107077024-B Liquid crystal display element 日产化学工业株式会社 2020-11-17 CN disclosed
US-10241359-B2 Liquid crystal display device NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2019-03-26 US disclosed
US-20170343840-A1 LIQUID CRYSTAL DISPLAY DEVICE NISSAN CHEMICAL INDUSTRIES, LTD. (JP) 2017-11-30 US disclosed
EP-3217212-A1 LIQUID CRYSTAL DISPLAY ELEMENT Nissan Chemical Industries, Ltd. (JP) 2017-09-13 EP disclosed
EP-2155808-B1 METHOD FOR TREATING THE SURFACE OF A SUBSTRATE BASED ON SULPHUR POLYMER, INTENDED TO BE COVERED WITH A COATING ESSILOR INT (COMPAGNIE GÉNÉRALE D'OPTIQUE) (FR) 2016-12-14 EP disclosed
US-9110223-B2 Method for treating the surface of a substrate based on sulphur polymer, intended to be covered with a coating ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2015-08-18 US disclosed
US-20100189889-A1 Method for Treating the Surface of a Substrate Based on Sulphur Polymer, Intended to be Covered with a Coating ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2010-07-29 US disclosed
US-7618141-B2 Polymerizable composition containing an odor masking agent and a perfume, an optical lens and a production method ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2009-11-17 US disclosed
US-7446228-B2 Thiophosphine compounds ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2008-11-04 US disclosed
WO-2001025302-A1 POLYMERISABLE COMPOSITIONS FOR MAKING TRANSPARENT POLYMER SUBSTRATES, RESULTING POLYMER SUBSTRATES AND THEIR USES IN OPTICS ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2001-04-12 WO disclosed
EP-0994907-A1 NOVEL POLYMERISABLE COMPOSITIONS AND OPTICAL LENSES WITH HIGH REFRACTIVE INDEX OBTAINED FROM SAID COMPOSITIONS ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2000-04-26 EP disclosed
WO-1999002575-A1 NOVEL POLYMERISABLE COMPOSITIONS AND OPTICAL LENSES WITH HIGH REFRACTIVE INDEX OBTAINED FROM SAID COMPOSITIONS ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 1999-01-21 WO disclosed
EP-0334051-B1 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KK (JP) 1996-05-01 EP disclosed
EP-0394495-B1 4,4'-BIS(METHACRYLOYLTHIO)DIPHENYL SULFIDE AND CURABLE COMPOSITION CONTAINING SAME SUMITOMO SEIKA CHEMICALS (JP) 1994-08-31 EP disclosed
US-5206092-A Irradiating a composition of polyolefin resin, dimethylsiloxane and a polyfunctional compound having unsaturation or thiol groups SHOWA DENKO K.K. (JP) 1993-04-27 US disclosed
US-5183917-A Curable; optics, coatings, seals, adhesives, paints SHOWA DENKO K.K. (JP) 1993-02-02 US disclosed
EP-0394495-A1 4,4'-BIS(METHACRYLOYLTHIO)DIPHENYL SULFIDE AND CURABLE COMPOSITION CONTAINING SAME SUMITOMO SEIKA CHEMICALS CO., LTD. (JP) 1990-10-31 EP disclosed
EP-0334051-A2 Electron beam-curable composition for release material and process for preparation of release material SHOWA DENKO KABUSHIKI KAISHA (JP) 1989-09-27 EP disclosed