SCHEMBL30102618

SCHEMBL30102618

C=CCCCCCCCCC(CC)SOC(=O)CC

nearest known ligand 0.41

Predicted protein targets (top 13)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 3/20 0.41
LMNA P02545 2/20 0.41
MAPT P10636 3/20 0.40
USP2 O75604 3/20 0.40
CYP3A4 P08684 2/20 0.40
SMN1; SMN2 Q16637 2/20 0.40
HPGD P15428 1/20 0.40
TSHR P16473 2/20 0.35
ABCC4 O15439 1/20 0.35
RECQL P46063 1/20 0.35
LPAR2 Q9HBW0 1/20 0.32
LPAR3 Q9UBY5 1/20 0.32
PLA2G2C Q5R387 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Methane SCHEMBL15393217 0.81 NAAA (0.42) LMNAMAPT
SCHEMBL816610 0.67 NAAA (0.62) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL28310365 0.67 NAAA (0.62) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL873655 0.67 NAAA (0.62) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL9781716 0.67 USP2 (0.55) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL5955831 0.66 CA2 (0.57) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL1024655 0.66 CA2 (0.57) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL2284656 0.66 CA2 (0.57) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL3120575 0.66 CA2 (0.57) ALDH1A1LMNAMAPTUSP2CYP3A4
SCHEMBL28574785 0.66 ALDH1A1 (0.65) ALDH1A1LMNAMAPTUSP2CYP3A4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12384930-B2 Photosensitive composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-08-12 US disclosed
US-12338357-B2 Photosensitive composition SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2025-06-24 US disclosed
US-20230034267-A1 PHOTOSENSITIVE COMPOSITION SUMITOMO CHEMICAL COMPANY, LIMITED (JP) 2023-02-02 US disclosed