SCHEMBL30122949

SCHEMBL30122949

C=C(C)C(=O)OC1CCOC1=O.C=C(C)C(=O)O[C@@H]1C[C@@H]2O[C@H]1[C@@H]1COC(=O)[C@@H]12

nearest known ligand 0.35

Predicted protein targets (top 19)

geneUniProtsupporting neighboursconfidence
SMN1; SMN2 Q16637 3/20 0.35
KDM4E B2RXH2 5/20 0.35
ALDH1A1 P00352 3/20 0.35
MAPK1 P28482 3/20 0.34
HPGD P15428 1/20 0.34
HSD17B10 Q99714 1/20 0.34
POLB P06746 3/20 0.34
TSHR P16473 1/20 0.32
CYP1A2 P05177 2/20 0.32
CYP2C19 P33261 2/20 0.32
CYP2C9 P11712 1/20 0.32
TDP1 Q9NUW8 3/20 0.30
NPC1 O15118 1/20 0.30
MAPT P10636 1/20 0.30
PKM P14618 1/20 0.30
HTT P42858 1/20 0.30
RECQL P46063 1/20 0.30
RAB9A P51151 1/20 0.30
ATM Q13315 1/20 0.30

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL92230 0.91 KDM4E (0.34) KDM4EALDH1A1POLBTDP1NPC1
SCHEMBL4687149 0.82 KDM4E (0.34) KDM4EALDH1A1POLBTDP1NPC1
SCHEMBL14972900 0.82 KDM4E (0.34) KDM4EALDH1A1POLBTDP1NPC1
SCHEMBL14777633 0.82 KDM4E (0.34) KDM4EALDH1A1POLBTDP1NPC1
SCHEMBL14777632 0.82 KDM4E (0.34) KDM4EALDH1A1POLBTDP1NPC1
SCHEMBL19012506 0.77 MAPK1 (0.49) SMN1; SMN2KDM4EALDH1A1MAPK1HPGD
SCHEMBL70883 0.77 MAPK1 (0.49) SMN1; SMN2KDM4EALDH1A1MAPK1HPGD
SCHEMBL23207778 0.77 ALDH1A1 (0.31) KDM4EALDH1A1POLBTDP1NPC1
Methacrylic Acid SCHEMBL17062929 0.73 MAPK1 (0.46) SMN1; SMN2KDM4EALDH1A1MAPK1HPGD
SCHEMBL15711307 0.73 ALDH1A1 (0.31) ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-12393118-B2 Composition for photoresist underlayer DUPONT ELECTRONIC MATERIALS INTERNATIONAL, LLC (US) 2025-08-19 US disclosed
US-20220397827-A1 COMPOSITION FOR PHOTORESIST UNDERLAYER U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT 2022-12-15 US disclosed