Predicted protein targets (top 13)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.34 |
| ▸ | NPC1 | O15118 | 1/20 | 0.34 |
| ▸ | POLB | P06746 | 1/20 | 0.34 |
| ▸ | MAPT | P10636 | 1/20 | 0.34 |
| ▸ | PKM | P14618 | 1/20 | 0.34 |
| ▸ | HTT | P42858 | 1/20 | 0.34 |
| ▸ | RECQL | P46063 | 1/20 | 0.34 |
| ▸ | RAB9A | P51151 | 1/20 | 0.34 |
| ▸ | ATM | Q13315 | 1/20 | 0.34 |
| ▸ | TDP1 | Q9NUW8 | 1/20 | 0.34 |
| ▸ | GPX4 | P36969 | 1/20 | 0.32 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.30 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14777632 | 1.00 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL14777633 | 1.00 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL14972900 | 1.00 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL92230 | 0.90 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL9880661 | 0.87 | ALDH1A1 (0.34) | ALDH1A1 | |
| SCHEMBL27047577 | 0.87 | — | — | |
| SCHEMBL14121029 | 0.87 | KDM4E (0.34) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL24401047 | 0.87 | LMNA (0.34) | — | |
| SCHEMBL30122949 | 0.82 | SMN1; SMN2 (0.35) | KDM4ENPC1POLBMAPTPKM | |
| SCHEMBL15711307 | 0.81 | ALDH1A1 (0.31) | ALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 89 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119161524-B | Polymer for electron beam photoresist and preparation method and application thereof | 中节能万润股份有限公司 | 2025-04-08 | — | — | CN | disclosed |
| CN-119161524-A | Polymer for electron beam photoresist and preparation method and application thereof | 中节能万润股份有限公司 | 2024-12-20 | — | — | CN | disclosed |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240027905-A1 | PHOTOACID GENERATORS, PHOTORESIST COMPOSITIONS, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-25 | — | — | US | disclosed |
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2024-01-18 | — | — | US | disclosed |
| US-11859082-B2 | Polymers useful as surface leveling agents | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-01-02 | — | — | US | disclosed |
| US-11859082-B2 | Polymers useful as surface leveling agents | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2024-01-02 | — | — | US | disclosed |
| US-11809077-B2 | Photoresist compositions and pattern formation methods | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2023-11-07 | — | — | US | disclosed |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-10-05 | — | — | US | disclosed |
| US-20230213862-A1 | PHOTORESIST COMPOSITIONS AND PATTERN FORMATION METHODS | U.S. BANK TRUST COMPANY, NATIONAL ASSOCIATION, AS NOTES COLLATERAL AGENT | 2023-07-06 | — | — | US | disclosed |
| US-20110039206-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-02-17 | — | — | US | disclosed |
| US-20110039206-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-02-17 | — | — | US | disclosed |
| US-20110039210-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) | 2011-02-17 | — | — | US | disclosed |
| EP-2253647-A1 | Novel resins and photoresist compositions comprising same | Rohm and Haas Electronic Materials, L.L.C. (US) | 2010-11-24 | — | — | EP | disclosed |
| EP-1352904-B1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | MITSUBISHI RAYON CO (JP) | 2008-10-08 | — | — | EP | disclosed |
| US-7339014-B2 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO., LTD. (JP) | 2008-03-04 | — | — | US | disclosed |
| US-7041838-B2 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI RAYON CO., LTD. (JP) | 2006-05-09 | — | — | US | disclosed |
| US-20050113538-A1 | (Meth)acrylate, raw material alcohol for the (meth)acrylate, method of producing the (meth)acrylate and the alcohol, polymer produced by polymerizing the (meth)acrylate, chemically amplified resist composition, and method of the formation of a pattern | MITSUBISHI RAYON CO.,LTD. (JP) | 2005-05-26 | — | — | US | disclosed |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | MITSUBISHI CHEMICAL CORPORATION (JP) | 2004-04-01 | — | — | US | disclosed |
| EP-1352904-A1 | (METH)ACRYLATE ESTERS, STARTING ALCOHOLS FOR THE PREPARATION THEREOF, PROCESSES FOR PREPARING BOTH, POLYMERS OF THE ESTERS, CHEMICALLY AMPLIFIABLE RESIST COMPOSITIONS, AND METHOD FOR FORMING PATTERNS | Mitsubishi Rayon Co., Ltd. (JP) | 2003-10-15 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (5 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20240019779-A1 | COMPOUNDS AND PHOTORESIST COMPOSITIONS INCLUDING THE SAME | CRY1, CCNT1, CCNA1 | KDM4E 1590/4885NPC1 2400/4885POLB 2467/4885 |
| US-20230314934-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | CRY1, CBR3, C1S | KDM4E 3165/4885NPC1 2740/4885POLB 1349/4885 |
| US-20110039206-A1 | NOVEL RESINS AND PHOTORESIST COMPOSITIONS COMPRISING SAME | PUF60, CAD, RARA | KDM4E 522/4885NPC1 4367/4885POLB 494/4885 |
| US-20040063882-A1 | (Meth)acrylate esters, starting alcohols for the preparation thereof, processes for preparing both, polymers of the esters, chemically amplifiable resist compositions, and method for forming patterns | ADH1A, ADH1C, ADH5 | KDM4E 698/4885NPC1 4812/4885POLB 715/4885 |
| US-20240027904-A1 | PHOTOACTIVE COMPOUNDS, PHOTORESIST COMPOSITIONS INCLUDING THE SAME, AND PATTERN FORMATION METHODS | C1S, C1R, CRY2 | KDM4E 4249/4885NPC1 3574/4885POLB 3243/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.