Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | LTA4H | P09960 | 3/20 | 0.50 |
| ▸ | TSHR | P16473 | 1/20 | 0.50 |
| ▸ | CA4 | P22748 | 1/20 | 0.45 |
| ▸ | KCNA3 | P22001 | 1/20 | 0.41 |
| ▸ | CA5A | P35218 | 1/20 | 0.39 |
| ▸ | CA5B | Q9Y2D0 | 1/20 | 0.39 |
| ▸ | NR1H2 | P55055 | 1/20 | 0.38 |
| ▸ | BAX | Q07812 | 1/20 | 0.38 |
| ▸ | MAOA | P21397 | 1/20 | 0.38 |
| ▸ | KCNH2 | Q12809 | 1/20 | 0.37 |
| ▸ | KDM4E | B2RXH2 | 1/20 | 0.37 |
| ▸ | GLA | P06280 | 1/20 | 0.37 |
| ▸ | MAPT | P10636 | 1/20 | 0.37 |
| ▸ | KMT2A | Q03164 | 1/20 | 0.37 |
| ▸ | ALDH1A1 | P00352 | 2/20 | 0.37 |
| ▸ | TDP1 | Q9NUW8 | 2/20 | 0.37 |
| ▸ | TAAR1 | Q96RJ0 | 1/20 | 0.36 |
| ▸ | RECQL | P46063 | 1/20 | 0.36 |
| ▸ | CA1 | P00915 | 1/20 | 0.36 |
| ▸ | CA2 | P00918 | 1/20 | 0.36 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL15653550 | 0.97 | LTA4H (0.47) | LTA4HTSHRCA4KCNA3CA5A | |
| SCHEMBL645275 | 0.88 | LTA4H (0.45) | LTA4HTSHRCA4KCNA3CA5A | |
| Phenol SCHEMBL7657761 | 0.87 | CA4 (0.55) | LTA4HTSHRCA4CA5ACA5B | |
| SCHEMBL8780512 | 0.87 | CA4 (0.42) | LTA4HTSHRCA4KCNA3CA5A | |
| SCHEMBL10323805 | 0.84 | HTT (0.47) | LTA4HTSHRCA4MAPTKMT2A | |
| SCHEMBL10323853 | 0.84 | HTT (0.47) | LTA4HTSHRCA4MAPTKMT2A | |
| SCHEMBL3996985 | 0.83 | CA4 (0.50) | LTA4HTSHRCA4KCNA3CA5A | |
| SCHEMBL633849 | 0.83 | CA4 (0.50) | LTA4HTSHRCA4KCNA3CA5A | |
| SCHEMBL7852131 | 0.83 | LTA4H (0.41) | LTA4HTSHRCA4KCNA3CA5A | |
| SCHEMBL1608970 | 0.83 | CA4 (0.50) | LTA4HTSHRCA4KCNA3CA5A |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 2357 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-122036786-A | Preparation method of high-purity phosphotriester | 浙江工业大学 | 2026-05-15 | — | — | CN | claimed |
| US-20260055310-A1 | MICROWAVE HEATING COMPOSITION AND PREPARATION THEREOF | FOSHAN SHUNDE ANBENXIN RUBBER PRODUCTS CO LTD (CN) | 2026-02-26 | — | — | US | claimed |
| US-12466937-B2 | Resin composition and use thereof | SHENGYI TECHNOLOGY CO., LTD. (CN) | 2025-11-11 | — | — | US | claimed |
| US-20250279474-A1 | SECONDARY BATTERY AND ELECTRICAL APPARATUS | CONTEMPORARY AMPEREX TECHNOLOGY (HONG KONG) LIMITED (CN) | 2025-09-04 | — | — | US | claimed |
| EP-4604242-A1 | SECONDARY BATTERY AND ELECTRICAL APPARATUS | Contemporary Amperex Technology (Hong Kong) Limited (HK) | 2025-08-20 | — | — | EP | claimed |
| US-20250256267-A1 | PILLARED STRUCTURES OF LAMELLAR MESOPOROUS CRYSTALLINE MICROPOROUS MATERIAL | SAUDI ARABIAN OIL COMPANY (SA) | 2025-08-14 | — | — | US | claimed |
| US-12378386-B2 | Resin composition and application thereof | SHENGYI TECHNOLOGY CO., LTD. (CN) | 2025-08-05 | — | — | US | claimed |
| US-12346026-B2 | Composition for forming underlayer film, resist pattern forming method, and manufacturing method of electronic device | FUJIFILM CORPORATION (JP) | 2025-07-01 | — | — | US | claimed |
| CN-120040704-A | Polyurethane foam composition, polyurethane foam, preparation method and application thereof | 广东美的制冷设备有限公司 | 2025-05-27 | — | — | CN | claimed |
| CN-120024900-A | Nano silicon carbide microsphere and preparation method and application thereof | 苏州纳微先进微球材料应用技术研究所有限公司 | 2025-05-23 | — | — | CN | claimed |
| EP-0067066-B1 | DRY-DEVELOPING RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-12-18 | — | — | EP | claimed |
| EP-0067067-B1 | DRY-DEVELOPING NEGATIVE RESIST COMPOSITION | FUJITSU LIMITED (JP) | 1985-09-25 | — | — | EP | claimed |
| US-4481279-A | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1984-11-06 | — | — | US | claimed |
| US-4464455-A | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1984-08-07 | — | — | US | claimed |
| US-4437882-A | HIGH SATURATION MAGNETIZATION | FUJI PHOTO FILM CO., LTD. (JP) | 1984-03-20 | — | — | US | claimed |
| EP-0074276-A1 | Process for polymerization of ethylene | UBE INDUSTRIES, LTD. (JP) | 1983-03-16 | — | — | EP | claimed |
| EP-0067066-A2 | Dry-developing resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| EP-0067067-A2 | Dry-developing negative resist composition | FUJITSU LIMITED (JP) | 1982-12-15 | — | — | EP | claimed |
| US-4242479-A | CATALYST OF ALUMINUM TRIHALIDE, ORGANOSILOXANE COMPOUND OR ETHER, MAGNESIUM ALCOHOLATE, TITANIUM-HALOGEN AND ORGANOALUMINUM COMPOUNDS | SHOWA YUKA KABUSHIKI KAISHA (JP) | 1980-12-30 | — | — | US | claimed |
| US-4055546-A | REACTION OF A PHENOLIC RESIN WITH AN ORGANIC SILICATE | HITACHI CHEMICAL COMPANY, LTD. (JA) | 1977-10-25 | — | — | US | claimed |