SCHEMBL3018884

SCHEMBL3018884

CC(S)(S)C(c1ccccc1)c1ccccc1

nearest known ligand 0.41

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
RIPK1 Q13546 2/20 0.40
SLC6A4 P31645 3/20 0.39
SLC6A3 Q01959 3/20 0.39
SLC6A2 P23975 2/20 0.39
DPP4 P27487 2/20 0.38
TSHR P16473 2/20 0.38
CHRM2 P08172 2/20 0.38
ADRA1A P35348 2/20 0.38
AOC3 Q16853 1/20 0.38
F2 P00734 1/20 0.38
CACNA1F O60840 1/20 0.38
CHRM1 P11229 1/20 0.38
ADRA2B P18089 1/20 0.38
CHRM3 P20309 1/20 0.38
HRH1 P35367 1/20 0.38
OPRK1 P41145 1/20 0.38
CACNA1D Q01668 1/20 0.38
KCNH2 Q12809 1/20 0.38
CACNA1S Q13698 1/20 0.38
CACNA1C Q13936 1/20 0.38

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL5029899 0.78 RIPK1 (0.43) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL28817806 0.74 RIPK1 (0.40) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL10476770 0.74 RIPK1 (0.43) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL708842 0.74 RIPK1 (0.40) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL16210936 0.74 RIPK1 (0.43) RIPK1SLC6A4SLC6A3SLC6A2AOC3
SCHEMBL23880379 0.74 RIPK1 (0.40) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL327102 0.74 RIPK1 (0.40) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL2212637 0.74 RIPK1 (0.40) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL352841 0.74 TAAR1 (0.46) RIPK1SLC6A4SLC6A3SLC6A2DPP4
SCHEMBL1132470 0.74 LMNA (0.41) RIPK1SLC6A4SLC6A3SLC6A2DPP4

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 21 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
EP-2155808-B1 METHOD FOR TREATING THE SURFACE OF A SUBSTRATE BASED ON SULPHUR POLYMER, INTENDED TO BE COVERED WITH A COATING ESSILOR INT (COMPAGNIE GÉNÉRALE D'OPTIQUE) (FR) 2016-12-14 EP disclosed
US-9110223-B2 Method for treating the surface of a substrate based on sulphur polymer, intended to be covered with a coating ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2015-08-18 US disclosed
US-20100189889-A1 Method for Treating the Surface of a Substrate Based on Sulphur Polymer, Intended to be Covered with a Coating ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2010-07-29 US disclosed
WO-2010043638-A2 CURABLE EPOXIDE FORMULATION CONTAINING SILICA BASF SE (DE) 2010-04-22 WO disclosed
EP-2155808-A1 METHOD FOR TREATING THE SURFACE OF A SUBSTRATE BASED ON SULPHUR POLYMER, INTENDED TO BE COVERED WITH A COATING Essilor International (Compagnie Générale D'Optique) (FR) 2010-02-24 EP disclosed
US-7618141-B2 Polymerizable composition containing an odor masking agent and a perfume, an optical lens and a production method ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2009-11-17 US disclosed
WO-2009121148-A1 DYE COMPRISING FUNCTIONAL SUBSTITUENT ADVANCED POLYMERIK PTY LTD (AU) 2009-10-08 WO disclosed
EP-2074162-A2 RADIATION CURABLE AND JETTABLE INK COMPOSITIONS Hexion Specialty Chemicals Research Belgium S.A. (BE) 2009-07-01 EP disclosed
WO-2009048585-A1 RADIATION CURABLE AND JETTABLE INK COMPOSITIONS HEXION SPECIALTY CHEMICALS, INC (US) 2009-04-16 WO disclosed
WO-2008155507-A1 METHOD FOR TREATING THE SURFACE OF A SUBSTRATE BASED ON SULPHUR POLYMER, INTENDED TO BE COVERED WITH A COATING ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2008-12-24 WO disclosed
WO-2008045517-A2 RADIATION CURABLE AND JETTABLE INK COMPOSITIONS HEXION SPECIALTY CHEMICALS, INC. (US) 2008-04-17 WO disclosed
EP-1877839-A2 THERMOSETTING POLY(THIO)URETHANE FORMULATION COMPRISING AT LEAST ONE BLOCK COPOLYMER AND USE THEREOF IN OPTICS FOR THE PRODUCTION OF ORGANIC LENSES HAVING IMPROVED TOUGHNESS ESSILOR INTERNATIONAL Compagnie Générale d'Optique (FR) 2008-01-16 EP disclosed
EP-1771489-A1 POLYMERISABLE COMPOSITION CONTAINING AN ODOUR MASKING AGENT AND A PERFUME, AN OPTICAL LENS AND A PRODUCTION METHOD ESSILOR INTERNATIONAL (Compagnie Générale d'Optique) (FR) 2007-04-11 EP disclosed
WO-2006103371-A2 THERMOSETTING POLY(THIO)URETHANE FORMULATION COMPRISING AT LEAST ONE BLOCK COPOLYMER AND USE THEREOF IN OPTICS FOR THE PRODUCTION OF ORGANIC LENSES HAVING IMPROVED TOUGHNESS ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2006-10-05 WO disclosed
WO-2006005874-A1 POLYMERISABLE COMPOSITION CONTAINING AN ODOUR MASKING AGENT AND A PERFUME, AN OPTICAL LENS AND A PRODUCTION METHOD ESSILOR INTERNATIONAL (COMPAGNIE GENERALE D'OPTIQUE) (FR) 2006-01-19 WO disclosed
EP-1608704-A2 THIOPHOSPHINE COMPOUNDS AND METHOD OF MAKING POLYMERISABLE COMPOSITIONS CONTAINING THEM AND THEIR USE FOR MAKING OPHTALMIC LENSES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2005-12-28 EP disclosed
WO-2004085447-A2 THIOPHOSPHINE COMPOUNDS AND METHOD OF MAKING POLYMERISABLE COMPOSITIONS CONTAINING THEM AND THEIR USE FOR MAKING OPHTALMIC LENSES ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2004-10-07 WO disclosed
EP-0986767-A1 OPTICAL LENS IN TRANSPARENT ORGANIC POLYMER MATERIAL WITH HIGH REFRACTIVE INDEX AND HIGH ABBE NUMBER ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 2000-03-22 EP disclosed
WO-1999052000-A1 OPTICAL LENS IN TRANSPARENT ORGANIC POLYMER MATERIAL WITH HIGH REFRACTIVE INDEX AND HIGH ABBE NUMBER ESSILOR INTERNATIONAL COMPAGNIE GENERALE D'OPTIQUE (FR) 1999-10-14 WO disclosed
EP-0330363-A2 Highly-refractive plastic lens and process for making the lens MITSUI TOATSU CHEMICALS, Inc. (JP) 1989-08-30 EP disclosed