SCHEMBL30210212

SCHEMBL30210212

O=C(Oc1ccc2ccccc2c1)C1CC2C=CC1C2

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
L3MBTL1 Q9Y468 2/20 0.54
FABP7 O15540 1/20 0.46
FABP3 P05413 1/20 0.46
ALDH1A1 P00352 7/20 0.44
POLB P06746 2/20 0.44
CYP1A2 P05177 1/20 0.44
CYP3A4 P08684 1/20 0.44
CYP2D6 P10635 1/20 0.44
CYP2C9 P11712 1/20 0.44
CYP2C19 P33261 1/20 0.44
SMN1; SMN2 Q16637 1/20 0.44
KMT2A Q03164 4/20 0.44
MAPT P10636 4/20 0.44
MEN1 O00255 2/20 0.44
TDP1 Q9NUW8 2/20 0.44
RAB9A P51151 1/20 0.44
CHRNA3 P32297 1/20 0.43
FAAH O00519 1/20 0.43
EPHX1 P07099 1/20 0.43
HPGD P15428 1/20 0.42

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL4095323 1.00 L3MBTL1 (0.54) L3MBTL1FABP7FABP3ALDH1A1POLB
SCHEMBL13888466 0.85 L3MBTL1 (0.39) L3MBTL1FABP7FABP3ALDH1A1POLB
SCHEMBL201849 0.84 ALDH1A1 (0.51) L3MBTL1ALDH1A1POLBKMT2AMAPT
SCHEMBL4107319 0.82 KMT2A (0.47) L3MBTL1FABP7FABP3ALDH1A1POLB
SCHEMBL22263679 0.81 ALDH1A1 (0.45) L3MBTL1ALDH1A1POLBSMN1; SMN2KMT2A
SCHEMBL30209870 0.81 ALDH1A1 (0.45) L3MBTL1ALDH1A1POLBSMN1; SMN2KMT2A
SCHEMBL20024423 0.80 KMT2A (0.58) ALDH1A1POLBCYP1A2KMT2AMEN1
SCHEMBL19601258 0.80 KMT2A (0.58) ALDH1A1POLBCYP1A2KMT2AMEN1
SCHEMBL6723704 0.80 LMNA (0.49) L3MBTL1ALDH1A1POLBSMN1; SMN2KMT2A
SCHEMBL22263926 0.79 KMT2A (0.44) L3MBTL1FABP7FABP3ALDH1A1POLB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-11886119-B2 Material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2024-01-30 US disclosed
CN-110709774-B Underlayer film forming material, resist underlayer film, method for producing resist underlayer film, and laminate 三井化学株式会社 2023-12-08 CN disclosed
US-20230185195-A1 MATERIAL FOR FORMING UNDERLAYER FILM, RESIST UNDERLAYER FILM, METHOD OF PRODUCING RESIST UNDERLAYER FILM, AND LAMINATE MITSUI CHEMICALS, INC. (JP) 2023-06-15 US disclosed
US-11599025-B2 Resin material for forming underlayer film, resist underlayer film, method of producing resist underlayer film, and laminate MITSUI CHEMICALS, INC. (JP) 2023-03-07 US disclosed