⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL2699137 | 0.97 | SHBG (0.32) | — | |
| SCHEMBL3020072 | 0.95 | — | — | |
| SCHEMBL3021255 | 0.89 | — | — | |
| SCHEMBL4499268 | 0.78 | ADH1A (0.35) | — | |
| SCHEMBL4494360 | 0.77 | POLB (0.33) | — | |
| SCHEMBL4489680 | 0.75 | CYP1A2 (0.40) | — | |
| SCHEMBL4488797 | 0.73 | CYP1A2 (0.39) | — | |
| SCHEMBL2770468 | 0.73 | SHBG (0.30) | — | |
| SCHEMBL22589043 | 0.72 | ALDH1A1 (0.39) | — | |
| SCHEMBL4488362 | 0.72 | EPHX1 (0.30) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 40 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | claimed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | claimed |
| CN-103102251-B | Radiation-ray sensitive composition | MITSUBISHI GAS CHEMICAL INC. (JP) | 2016-01-20 | — | — | CN | claimed |
| CN-104281006-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2015-01-14 | — | — | CN | claimed |
| CN-101528653-B | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO | 2013-09-11 | — | — | CN | claimed |
| CN-105264440-B | Anti-corrosion agent composition | 三菱瓦斯化学株式会社 | 2019-09-24 | — | — | CN | disclosed |
| CN-104281006-B | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2019-01-22 | — | — | CN | disclosed |
| CN-109154777-A | Resist lower membrane, which is formed, uses composition, lower layer film for lithography and pattern forming method | 三菱瓦斯化学株式会社 | 2019-01-04 | — | — | CN | disclosed |
| CN-109073782-A | Optical element forms composition and its solidfied material | 三菱瓦斯化学株式会社 | 2018-12-21 | — | — | CN | disclosed |
| CN-108137478-A | Compound, resin, resist composition or radiation-sensitive composition, method for forming resist pattern, method for producing amorphous film, material for forming underlayer film for lithography, composition for forming underlayer film for lithography, method for forming circuit pattern, and purification method | 三菱瓦斯化学株式会社 | 2018-06-08 | — | — | CN | disclosed |
| CN-108008600-A | Radiation-ray sensitive composition | 三菱瓦斯化学株式会社 | 2018-05-08 | — | — | CN | disclosed |
| CN-107949808-A | Lower layer film for lithography forms material, lower layer film for lithography is formed with composition, lower layer film for lithography and its manufacture method, pattern formation method, resin and purification process | 三菱瓦斯化学株式会社 | 2018-04-20 | — | — | CN | disclosed |
| EP-2194983-A1 | COMPOUNDS WHICH HAVE ACTIVITY AT M1 RECEPTOR AND THEIR USES IN MEDICINE | Glaxo Group Limited (GB) | 2010-06-16 | — | — | EP | disclosed |
| EP-2194982-A1 | COMPOUNDS WHICH HAVE ACTIVITY AT M1 RECEPTOR AND THEIR USES IN MEDICINE | Glaxo Group Limited (GB) | 2010-06-16 | — | — | EP | disclosed |
| CN-101528653-A | Radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2009-09-09 | — | — | CN | disclosed |
| WO-2009037296-A1 | COMPOUNDS WHICH HAVE ACTIVITY AT M1 RECEPTOR AND THEIR USES IN MEDICINE | GLAXO GROUP LIMITED (GB) | 2009-03-26 | — | — | WO | disclosed |
| WO-2009037294-A1 | COMPOUNDS WHICH HAVE ACTIVITY AT M1 RECEPTOR AND THEIR USES IN MEDICINE | GLAXO GROUP LIMITED (GB) | 2009-03-26 | — | — | WO | disclosed |
| CN-101088046-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2007-12-12 | — | — | CN | disclosed |
| CN-1853141-A | Compound for resist and radiation-sensitive composition | MITSUBISHI GAS CHEMICAL CO (JP) | 2006-10-25 | — | — | CN | disclosed |
| CN-1517794-A | Resist composition | 三菱瓦斯化学株式会社 | 2004-08-04 | — | — | CN | disclosed |