⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| Naphthoquinone SCHEMBL27486918 | 0.80 | IDO1 (0.44) | — | |
| SCHEMBL5586196 | 0.77 | — | — | |
| SCHEMBL5604952 | 0.77 | — | — | |
| 1,2-Naphthoquinone SCHEMBL3027882 | 0.75 | PTPRC (0.54) | — | |
| SCHEMBL3034904 | 0.73 | CA1 (0.33) | — | |
| SCHEMBL27601001 | 0.68 | — | — | |
| SCHEMBL26677 | 0.66 | — | — | |
| SCHEMBL28758879 | 0.63 | — | — | |
| SCHEMBL11357834 | 0.61 | CA1 (0.38) | — | |
| SCHEMBL28734829 | 0.61 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 17 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8409783-B2 | Copolymer, resin composition, spacer for display panel, planarization film, thermosetting protective film, microlens, and process for producing copolymer | TOKYO OHKA KOGYO CO., LTD. (JP) | 2013-04-02 | — | — | US | disclosed |
| CN-102459416-A | Method for producing polyhydroxyimide | NISSAN CHEMICAL IND LTD | 2012-05-16 | — | — | CN | disclosed |
| CN-1841197-B | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element | JSR CORP | 2011-07-06 | — | — | CN | disclosed |
| CN-1760757-B | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO | 2010-11-10 | — | — | CN | disclosed |
| CN-1760758-B | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO | 2010-11-03 | — | — | CN | disclosed |
| US-20100209847-A1 | COPOLYMER, RESIN COMPOSITION, SPACER FOR DISPLAY PANEL, PLANARIZATION FILM, THERMOSETTING PROTECTIVE FILM, MICROLENS, AND PROCESS FOR PRODUCING COPOLYMER | TOKYO OHKA KOGYO CO., LTD. (JP) | 2010-08-19 | — | — | US | disclosed |
| CN-100336137-C | Composition for forming photosensitive dielectric material, and transfer film, dielectric material and electronic parts using the same | JSR CORP (JP) | 2007-09-05 | — | — | CN | disclosed |
| CN-1841197-A | X-ray sensitive resin composition, protruded body and barrier body formed thereby, forming method thereof and liquid crystal display element | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1841194-A | X-ray sensitive resin composition, protruded body and barrier body formed thereby and liquid crystal display element | JSR CORP (JP) | 2006-10-04 | — | — | CN | disclosed |
| CN-1272669-C | Radiation sensitive resin composite, method for forming insulating film having pattern, active matrix plate and panel display equipped with the film and method for producing panel display device | SHARP KK (JP) | 2006-08-30 | — | — | CN | disclosed |
| CN-1760756-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1760757-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1760758-A | Radioactivity sensitive resin composition | SUMITOMO CHEMICAL CO (JP) | 2006-04-19 | — | — | CN | disclosed |
| CN-1505820-A | Composition for forming photosensitive dielectric, and decal film, dielectric and electronic component using the same | ������ʱ����ʽ���� | 2004-06-16 | — | — | CN | disclosed |
| CN-1479173-A | Radiation sensitive resin composite, method for forming insulating film having pattern, active matrix plate and panel display equipped with the film and method for producing panel display device | 夏普株式会社 | 2004-03-03 | — | — | CN | disclosed |
| EP-0301101-B1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | NIPPON PAINT CO., LTD. (JP) | 1993-06-23 | — | — | EP | disclosed |
| EP-0301101-A1 | POSITIVE PHOTOSENSITIVE RESIN COMPOSITION | NIPPON PAINT CO., LTD. (JP) | 1989-02-01 | — | — | EP | disclosed |