⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL5586196 | 0.83 | — | — | |
| SCHEMBL3034904 | 0.83 | CA1 (0.33) | — | |
| Benzoquinone SCHEMBL6709400 | 0.81 | ALDH1A1 (0.40) | — | |
| SCHEMBL88256 | 0.77 | — | — | |
| SCHEMBL7539505 | 0.77 | — | — | |
| SCHEMBL27601001 | 0.77 | — | — | |
| SCHEMBL3034902 | 0.77 | — | — | |
| SCHEMBL16702618 | 0.76 | GSK3A (0.48) | — | |
| Naphthoquinone SCHEMBL106247 | 0.75 | IDO1 (0.54) | — | |
| Benzene SCHEMBL8170940 | 0.75 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 73 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-5080998-A | PROCESS FOR THE FORMATION OF POSITIVE IMAGES UTILIZING ELECTRODEPOSITION OF O-QUINONE DIAZIDE COMPOUND CONTAINING PHOTORESIST ON CONDUCTIVE SURFACE | CIBA-GEIGY CORPORATION (US) | 1992-01-14 | — | — | US | claimed |
| EP-0265387-A2 | Method of forming images | CIBA-GEIGY AG (CH) | 1988-04-27 | — | — | EP | claimed |
| JP-9061998-A | — | — | None | — | — | JP | disclosed |
| JP-7104467-A | — | — | None | — | — | JP | disclosed |
| CN-117769684-A | Resist auxiliary film composition and pattern forming method using the same | 三菱瓦斯化学株式会社 | 2024-03-26 | — | — | CN | disclosed |
| US-11681227-B2 | Enhanced EUV photoresist materials, formulations and processes | IRRESISTIBLE MATERIALS LTD (GB) | 2023-06-20 | — | — | US | disclosed |
| US-11543749-B2 | Resist composition and method for producing resist pattern, and method for producing plated molded article | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2023-01-03 | — | — | US | disclosed |
| CN-115151863-A | Resist composition and method of using the same | 三菱瓦斯化学株式会社 | 2022-10-04 | — | — | CN | disclosed |
| CN-113994256-A | Method for forming EUV patterned resist | 亚历克斯·P·G·罗宾逊 | 2022-01-28 | — | — | CN | disclosed |
| US-20210278765-A1 | RESIST COMPOSITION AND METHOD FOR PRODUCING RESIST PATTERN, AND METHOD FOR PRODUCING PLATED MOLDED ARTICLE | SUMITOMO CHEMICAL COMPANY, LIMITED (JP) | 2021-09-09 | — | — | US | disclosed |
| US-20200272050-A1 | Enhanced EUV Photoresist Materials, Formulations and Processes | IRRESISTIBLE MATERIALS, LTD (GB) | 2020-08-27 | — | — | US | disclosed |
| US-5451345-A | Chemical composition | CIBA-GEIGY CORPORATION (US) | 1995-09-19 | — | — | US | disclosed |
| EP-0662636-A2 | Method of forming images | CIBA-GEIGY AG (CH) | 1995-07-12 | — | — | EP | disclosed |
| JP-H07104467-A | POSITIVE RESIST COMPOSITION AND PATTERN FORMING METHOD | SHIN ETSU CHEM CO LTD | 1995-04-21 | — | — | JP | disclosed |
| EP-0592139-A1 | Composition for priming and cleaning based on organosilane | CIBA-GEIGY AG (CH) | 1994-04-13 | — | — | EP | disclosed |
| US-5080998-A | PROCESS FOR THE FORMATION OF POSITIVE IMAGES UTILIZING ELECTRODEPOSITION OF O-QUINONE DIAZIDE COMPOUND CONTAINING PHOTORESIST ON CONDUCTIVE SURFACE | CIBA-GEIGY CORPORATION (US) | 1992-01-14 | — | — | US | disclosed |
| US-5002858-A | Process for the formation of an image | CIBA-GEIGY CORPORATION (US) | 1991-03-26 | — | — | US | disclosed |
| US-4857437-A | Process for the formation of an image | CIBA-GEIGY CORPORATION (US) | 1989-08-15 | — | — | US | disclosed |
| EP-0265387-A2 | Method of forming images | CIBA-GEIGY AG (CH) | 1988-04-27 | — | — | EP | disclosed |
| JP-H00961998-A | — | — | 0001-01-01 | — | — | JP | disclosed |