⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL9609723 | 0.87 | CYP1A2 (0.30) | — | |
| SCHEMBL7063450 | 0.87 | CYP1A2 (0.30) | — | |
| SCHEMBL30428039 | 0.81 | — | — | |
| SCHEMBL4925105 | 0.78 | — | — | |
| SCHEMBL18458681 | 0.78 | SHBG (0.32) | — | |
| SCHEMBL23521394 | 0.77 | CYP1A2 (0.45) | — | |
| SCHEMBL6112855 | 0.77 | CYP1A2 (0.45) | — | |
| SCHEMBL29004596 | 0.76 | — | — | |
| SCHEMBL7090715 | 0.74 | — | — | |
| SCHEMBL3909897 | 0.74 | GNAO1 (0.36) | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 6 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-119535891-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2025-02-28 | — | — | CN | disclosed |
| CN-119535892-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2025-02-28 | — | — | CN | disclosed |
| CN-116203800-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-25 | — | — | CN | disclosed |
| CN-115951558-B | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-08-04 | — | — | CN | disclosed |
| CN-116203800-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-06-02 | — | — | CN | disclosed |
| CN-115951558-A | Photosensitive resin composition containing polysiloxane | 上海玟昕科技有限公司 | 2023-04-11 | — | — | CN | disclosed |