SCHEMBL30378162

SCHEMBL30378162

CC1C(=O)C2CCC(C)(C2)C1=O

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL1172853 0.68 STAT1 (0.31)
SCHEMBL12506427 0.66 STAT1 (0.32)
SCHEMBL2917939 0.65 TP53 (0.36)
SCHEMBL18593584 0.65 PAX8 (0.35)
SCHEMBL15111164 0.64 TRPA1 (0.35)
SCHEMBL13239541 0.63 CYP19A1 (0.33)
SCHEMBL13811069 0.62 POLB (0.31)
SCHEMBL3813759 0.61 MEN1 (0.30)
SCHEMBL10590428 0.61
SCHEMBL7940652 0.60

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
WO-2023092817-A1 ADDITIVE FOR 193 NM DRY PHOTORESIST AND PREPARATION METHOD FOR AND APPLICATION OF ADDITIVE 上海新阳半导体材料股份有限公司 2023-06-01 WO disclosed