SCHEMBL30394652

SCHEMBL30394652

CC(c1ccc(Oc2ccc(N3C(=O)C=CC3=O)cc2)c(Br)c1)c1ccc(Oc2ccc(N3C(=O)C=CC3=O)cc2)c(Br)c1

nearest known ligand 0.49

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
MGLL Q99685 12/20 0.49
HSP90AA1 P07900 3/20 0.42
PKM P14618 2/20 0.42
MEN1 O00255 1/20 0.42
ALDH1A1 P00352 1/20 0.42
LMNA P02545 1/20 0.42
HPGD P15428 1/20 0.42
HTT P42858 1/20 0.42
CCR6 P51684 1/20 0.42
KMT2A Q03164 1/20 0.42
ATM Q13315 1/20 0.42
FAAH O00519 3/20 0.41
NTRK1 P04629 1/20 0.39
NTRK3 Q16288 1/20 0.39
NTRK2 Q16620 1/20 0.39
PTGS1 P23219 1/20 0.39
PTGS2 P35354 1/20 0.39
G6PD P11413 1/20 0.38
TLR9 Q9NR96 1/20 0.38
FFAR1 O14842 1/20 0.37

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL348949 1.00 MGLL (0.49) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL349016 0.85 MGLL (0.50) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL349863 0.84 MGLL (0.53) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL348789 0.81 MGLL (0.64) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL8852750 0.79 MGLL (0.56) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL348030 0.79 MGLL (0.47) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL348535 0.78 MGLL (0.54) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL8852819 0.77 MGLL (0.58) MGLLHSP90AA1PKMMEN1ALDH1A1
SCHEMBL7611680 0.76 MAPT (0.43) MEN1ALDH1A1HPGDKMT2AFFAR1
SCHEMBL9156707 0.75 MGLL (0.79) MGLLHSP90AA1PKMMEN1ALDH1A1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-111683986-B Composition for forming cured film, alignment material, and retardation material 日产化学株式会社 2025-01-10 CN disclosed
CN-117539127-A Composition for forming resist underlayer film containing amide solvent 日产化学株式会社 2024-02-09 CN disclosed
CN-110192152-B Composition for forming resist underlayer film containing amide solvent 日产化学株式会社 2023-11-03 CN disclosed
CN-115975155-A Composition for forming cured film for alignment material, and retardation material 日产化学株式会社 2023-04-18 CN disclosed