Predicted protein targets (top 1)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL24687529 | 1.00 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL21505907 | 1.00 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL27209638 | 0.85 | ALDH1A1 (0.41) | ALDH1A1 | |
| SCHEMBL10180142 | 0.84 | — | — | |
| SCHEMBL10181563 | 0.83 | THRB (0.33) | ALDH1A1 | |
| SCHEMBL75085 | 0.80 | CHRM2 (0.38) | ALDH1A1 | |
| SCHEMBL18643942 | 0.80 | CHRM2 (0.38) | ALDH1A1 | |
| SCHEMBL18714190 | 0.80 | CHRM2 (0.38) | ALDH1A1 | |
| SCHEMBL10180115 | 0.80 | — | — | |
| SCHEMBL10065786 | 0.79 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 116 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-7122291-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-10-17 | — | — | US | claimed |
| WO-2006013475-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2006-02-09 | — | — | WO | claimed |
| US-20060024610-A1 | Photosensitivity and reduces edge roughness of the imaged photoresist profiles | MERCK PATENT GMBH (DE) | 2006-02-02 | — | — | US | claimed |
| US-12032290-B2 | Actinic ray-sensitive or radiation-sensitive resin composition, resist film, pattern forming method, and method for manufacturing electronic device | FUJIFILM CORPORATION (JP) | 2024-07-09 | — | — | US | disclosed |
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-20230375925-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, METHOD FOR MANUFACTURING ELECTRONIC DEVICE, COMPOUND, AND RESIN | FUJIFILM CORPORATION (JP) | 2023-11-23 | — | — | US | disclosed |
| US-20230367212-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367210-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION, ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE FILM, PATTERN FORMING METHOD, AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-20230367212-A1 | PATTERN FORMING METHOD AND METHOD FOR MANUFACTURING ELECTRONIC DEVICE | FUJIFILM CORPORATION (JP) | 2023-11-16 | — | — | US | disclosed |
| US-11697754-B2 | Thermal conductive layer, photosensitive layer, photosensitive composition, manufacturing method for thermal conductive layer, and laminate and semiconductor device | FUJIFILM CORPORATION (JP) | 2023-07-11 | — | — | US | disclosed |
| US-20070098920-A1 | Optical film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070098920-A1 | Optical film, polarizing plate and liquid crystal display | FUJIFILM CORPORATION (JP) | 2007-05-03 | — | — | US | disclosed |
| US-20070002232-A1 | Optical compensation film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-20070002232-A1 | Optical compensation film, polarizing plate and liquid crystal display device | FUJI PHOTO FILM CO., LTD. (JP) | 2007-01-04 | — | — | US | disclosed |
| US-7122291-B2 | Photoresist compositions | AZ ELECTRONIC MATERIALS USA CORP. (US) | 2006-10-17 | — | — | US | disclosed |
| US-20060127801-A1 | Resist polymer and resist composition | MITSUBISHI RAYON CO., LTD. (JP) | 2006-06-15 | — | — | US | disclosed |
| WO-2006013475-A2 | PHOTORESIST COMPOSITIONS | AZ ELECTRONIC MATERIAL USA CORP. (DE) | 2006-02-09 | — | — | WO | disclosed |
| US-20060024610-A1 | Photosensitivity and reduces edge roughness of the imaged photoresist profiles | MERCK PATENT GMBH (DE) | 2006-02-02 | — | — | US | disclosed |
| US-6165678-A | Lithographic photoresist composition and process for its use in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-12-26 | — | — | US | disclosed |