Predicted protein targets (top 3)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | THRB | P10828 | 1/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.33 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.32 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL21505907 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL304110 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL24687529 | 0.83 | ALDH1A1 (0.31) | ALDH1A1 | |
| SCHEMBL18400941 | 0.74 | ALDH1A1 (0.43) | THRBTSHRALDH1A1 | |
| SCHEMBL19718945 | 0.74 | ALDH1A1 (0.43) | THRBTSHRALDH1A1 | |
| SCHEMBL10180142 | 0.72 | — | — | |
| SCHEMBL13458358 | 0.70 | THRB (0.41) | THRBTSHRALDH1A1 | |
| SCHEMBL23059482 | 0.70 | — | — | |
| SCHEMBL27818005 | 0.70 | NAAA (0.49) | THRBTSHRALDH1A1 | |
| SCHEMBL25239579 | 0.69 | NAAA (0.50) | THRBTSHRALDH1A1 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8802349-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-8802349-B2 | Actinic ray-sensitive or radiation-sensitive resin composition and resist film and pattern forming method using the composition | FUJIFILM CORPORATION (JP) | 2014-08-12 | — | — | US | disclosed |
| US-20120015301-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |
| US-20120015301-A1 | ACTINIC RAY-SENSITIVE OR RADIATION-SENSITIVE RESIN COMPOSITION AND RESIST FILM AND PATTERN FORMING METHOD USING THE COMPOSITION | FUJIFILM CORPORATION (JP) | 2012-01-19 | — | — | US | disclosed |