SCHEMBL3041595

SCHEMBL3041595

C=CCN(CC=C)[Si](Cl)(Cl)Cl

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL3478236 0.76 ALDH1A1 (0.32)
SCHEMBL15170598 0.76 ALDH1A1 (0.32)
SCHEMBL716802 0.69
SCHEMBL3803865 0.69 ALDH1A1 (0.32)
SCHEMBL7645091 0.69
SCHEMBL9110099 0.69 KDM4E (0.31)
SCHEMBL10588340 0.67
SCHEMBL1585783 0.67
SCHEMBL3435783 0.67
SCHEMBL2162666 0.67

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 7 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7767840-B2 Organometallic compounds ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2010-08-03 US disclosed
US-20090156852-A1 Organometallic compounds ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2009-06-18 US disclosed
EP-1464724-B1 Organometallic germanium compounds suitable for use in vapor deposition processes ROHM & HAAS ELECT MAT (US) 2008-12-10 EP disclosed
EP-1990345-A1 Organometallic germanium compounds suitable for use in vapor deposition processes Rohm and Haas Electronic Materials LLC (US) 2008-11-12 EP disclosed
US-7413776-B2 Method of depositing a metal-containing film ROHM AND HAAS ELECTRONIC MATERIALS LLC (US) 2008-08-19 US disclosed
US-20040194703-A1 Organometallic compounds ROHM AND HAAS ELECTRONIC MATERIALS, L.L.C. 2004-10-07 US disclosed
EP-1464724-A2 Organometallic compounds suitable for use in vapor deposition processes Rohm and Haas Electronic Materials, L.L.C. (US) 2004-10-06 EP disclosed