SCHEMBL3049402

SCHEMBL3049402

Oc1ccccc1C12CCC(CC1)C2

nearest known ligand 0.43

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALOX5AP P20292 1/20 0.37
MEN1 O00255 3/20 0.36
KMT2A Q03164 3/20 0.36
POLB P06746 2/20 0.36
GAA P10253 1/20 0.36
GFER P55789 1/20 0.36
KDM4E B2RXH2 2/20 0.36
ALDH1A1 P00352 2/20 0.36
MAPT P10636 2/20 0.36
HPGD P15428 2/20 0.36
HSD17B10 Q99714 2/20 0.36
NPC1 O15118 1/20 0.36
CA12 O43570 1/20 0.36
GMNN O75496 1/20 0.36
EGFR P00533 1/20 0.36
CA2 P00918 1/20 0.36
LMNA P02545 1/20 0.36
FYN P06241 1/20 0.36
CA3 P07451 1/20 0.36
CYP3A4 P08684 1/20 0.36

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL12804771 0.87 KDM4E (0.39) ALOX5APMEN1KMT2APOLBGAA
SCHEMBL10388099 0.87 ALDH1A1 (0.39) ALOX5APMEN1KMT2APOLBKDM4E
SCHEMBL9467542 0.87 KDM1A (0.36) KDM1AMAOBHTR2AHTR2CHRH1
SCHEMBL13004757 0.83 IDO1 (0.35) ALOX5APMEN1KMT2APOLBGAA
SCHEMBL29809124 0.83 MEN1 (0.48) MEN1KMT2APOLBGAAGFER
SCHEMBL345587 0.83 MEN1 (0.48) MEN1KMT2APOLBGAAGFER
SCHEMBL237723 0.80 GRIN2D (0.43) ALOX5APMEN1KMT2APOLBGAA
SCHEMBL13004764 0.80 IDO1 (0.45) ALOX5APMEN1KMT2APOLBGAA
SCHEMBL13004822 0.80 MEN1 (0.44) ALOX5APMEN1KMT2APOLBGAA
SCHEMBL3966445 0.79 ERN1 (0.33) OPRK1OPRM1OPRD1RARARARB

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 2 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8338078-B2 Photoresist undercoat-forming material and patterning process SHIN-ETSU CHEMICAL CO., LTD. (JP) 2012-12-25 US disclosed
US-20100104977-A1 PHOTORESIST UNDERCOAT-FORMING MATERIAL AND PATTERNING PROCESS SHIN-ETSU CHEMICAL CO., LTD. (JP) 2010-04-29 US disclosed