Hydrogen Sulfide

Hydrogen Sulfide

SCHEMBL30503988

COc1ccc(C=Cc2nc(C(Cl)(Cl)Cl)nc(C(Cl)(Cl)Cl)n2)cc1.S

nearest known ligand 0.53

Full drug profile on Sugi Atlas →

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
CYP1A2 P05177 3/20 0.49
KDM4E B2RXH2 3/20 0.49
CYP3A4 P08684 2/20 0.49
NPC1 O15118 1/20 0.49
CYP2D6 P10635 1/20 0.49
CYP2C9 P11712 1/20 0.49
HPGD P15428 1/20 0.49
CYP2C19 P33261 1/20 0.49
RAB9A P51151 1/20 0.49
SMN1; SMN2 Q16637 1/20 0.49
RELA Q04206 3/20 0.47
TRPA1 O75762 1/20 0.47
NFE2L2 Q16236 2/20 0.46
MAPT P10636 2/20 0.46
AHR P35869 2/20 0.46
MEN1 O00255 1/20 0.46
KMT2A Q03164 1/20 0.46
CYP1A1 P04798 3/20 0.46
CYP1B1 Q16678 3/20 0.46
ESR1 P03372 2/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL51498 0.98 CYP1A2 (0.50) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL21940412 0.98 CYP1A2 (0.50) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL51497 0.98 CYP1A2 (0.50) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL153282 0.90 MAPT (0.55) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL811981 0.90 MAPT (0.55) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL12595129 0.90 RELA (0.47) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL12379805 0.90 RELA (0.47) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL598359 0.89 CYP1A2 (0.44) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL598360 0.89 CYP1A2 (0.44) CYP1A2KDM4ECYP3A4NPC1CYP2D6
SCHEMBL6336130 0.88 CYP1A2 (0.44) CYP1A2KDM4ECYP3A4NPC1CYP2D6

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360213-A Resin composition and photoresist patterning method using the same 深圳市容大感光科技股份有限公司 2023-06-30 CN disclosed