Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CYP1A2 | P05177 | 3/20 | 0.50 |
| ▸ | KDM4E | B2RXH2 | 3/20 | 0.50 |
| ▸ | CYP3A4 | P08684 | 2/20 | 0.50 |
| ▸ | NPC1 | O15118 | 1/20 | 0.50 |
| ▸ | CYP2D6 | P10635 | 1/20 | 0.50 |
| ▸ | CYP2C9 | P11712 | 1/20 | 0.50 |
| ▸ | HPGD | P15428 | 1/20 | 0.50 |
| ▸ | CYP2C19 | P33261 | 1/20 | 0.50 |
| ▸ | RAB9A | P51151 | 1/20 | 0.50 |
| ▸ | SMN1; SMN2 | Q16637 | 1/20 | 0.50 |
| ▸ | RELA | Q04206 | 3/20 | 0.49 |
| ▸ | TRPA1 | O75762 | 1/20 | 0.49 |
| ▸ | NFE2L2 | Q16236 | 2/20 | 0.47 |
| ▸ | AHR | P35869 | 2/20 | 0.47 |
| ▸ | MAPT | P10636 | 2/20 | 0.47 |
| ▸ | CYP1A1 | P04798 | 3/20 | 0.47 |
| ▸ | CYP1B1 | Q16678 | 3/20 | 0.47 |
| ▸ | ESR1 | P03372 | 2/20 | 0.47 |
| ▸ | TUBB4A | P04350 | 2/20 | 0.47 |
| ▸ | TUBB | P07437 | 2/20 | 0.47 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL51497 | 1.00 | CYP1A2 (0.50) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL21940412 | 1.00 | CYP1A2 (0.50) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| Hydrogen Sulfide SCHEMBL30503988 | 0.98 | CYP1A2 (0.49) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL153282 | 0.91 | MAPT (0.55) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL811981 | 0.91 | MAPT (0.55) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL12595129 | 0.91 | RELA (0.47) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL12379805 | 0.91 | RELA (0.47) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL598359 | 0.91 | CYP1A2 (0.44) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL598360 | 0.91 | CYP1A2 (0.44) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 | |
| SCHEMBL6336130 | 0.90 | CYP1A2 (0.44) | CYP1A2KDM4ECYP3A4NPC1CYP2D6 |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Appears in 5681 patents — a generic fragment claimed broadly, so it's down-weighted as IP noise. Top by claim status then date:
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| CN-121873631-B | Spin-on carbon composition, semiconductor preparation method and semiconductor device | Jiageng Innovation Laboratory (CN) | 2026-05-26 | — | — | CN | claimed |
| CN-122011922-A | Bottom anti-reflection coating composition and preparation and application thereof | 嘉庚创新实验室 | 2026-05-12 | — | — | CN | claimed |
| EP-4469534-B1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | AMPERIAL TECH GMBH (DE) | 2026-03-04 | — | — | EP | claimed |
| US-20260035490-A1 | PHOTOPOLYMERIZATION SYNERGIST | Piedmont Chemical Industries I, LLC | 2026-02-05 | — | — | US | claimed |
| EP-4601858-A1 | METHOD FOR THREE-DIMENSIONAL PRINTING OF FIBER COMPOSITE MATERIALS | MOI COMPOSITES S.r.l. (IT) | 2025-08-20 | — | — | EP | claimed |
| WO-2025137444-A1 | ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY | BREWER SCIENCE, INC. (US) | 2025-06-26 | — | — | WO | claimed |
| US-20250208517-A1 | ACIDIC SPIN-ON CARBON (SOC) LAYER FOR EUV LITHOGRAPHY | BREWER SCIENCE, INC. | 2025-06-26 | — | — | US | claimed |
| CN-120195934-A | Low-temperature negative photoresist composition | 深圳迪道微电子科技有限公司 | 2025-06-24 | — | — | CN | claimed |
| US-20250189857-A1 | COMPOSITION AND METHOD FOR FORMING AN ELECTROCHROMIC LAYER | Amperial Technologies GmbH (DE) | 2025-06-12 | — | — | US | claimed |
| CN-120065626-A | Photocurable composition | 茂名清荷科技有限公司 | 2025-05-30 | — | — | CN | claimed |
| US-4559401-A | Process for preparing chromophore-substituted vinyl-halomethyl-s-triazines | POLYCHROME CORPORATION (US) | 1985-12-17 | — | — | US | claimed |
| US-4528059-A | Anaerobically-cuting compositions | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1985-07-09 | — | — | US | claimed |
| US-4500608-A | ACRYLIC ESTER, HALOGEN INITIATOR, SECOND INITIATOR, AND POLYMERIZATION INHIBITOR | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1985-02-19 | — | — | US | claimed |
| US-4447588-A | ACRYLATE, HALOTRIAZINE OR HALOCARBONYL COMPOUND, FREE RADICAL POLYMERIZATION INHIBITOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1984-05-08 | — | — | US | claimed |
| US-4413108-A | HALOGEN COMPOUND AS FIRST INITIATOR, THIOL AS SECOND INITIATOR | MINNESOTA MINING & MANUFACTURING COMPANY (US) | 1983-11-01 | — | — | US | claimed |
| US-4404345-A | UNSATURATED CARBOXYL MONOMER, HALOGENATED PROMOTER, POLYMERIZATION INHIBITOR WITH REALTION PRODUCT OF ALDEHYDE AND AMINE | MINNESOTA MINING AND MANUFACTURING COMPANY (US) | 1983-09-13 | — | — | US | claimed |
| EP-0003263-B1 | A METHOD OF FORMING AN IMAGE, AND AN IMAGING ELEMENT FOR INHIBITING IMAGE FORMATION WITH COBALT (III) COMPLEXES | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1982-09-29 | — | — | EP | claimed |
| US-4239850-A | PHOTOINITIATOR OF AN UNSATURATED KETONE AND A TRIHALOMETHYL TRIAZINE | FUJI PHOTO FILM CO., LTD. (JP) | 1980-12-16 | — | — | US | claimed |
| EP-0003263-A1 | A method of forming an image, and an imaging element for inhibiting image formation with cobalt (III) complexes | EASTMAN KODAK COMPANY (a New Jersey corporation) (US) | 1979-08-08 | — | — | EP | claimed |
| WO-1979000448-A1 | INHIBITING IMAGE FORMATION WITH COBALT(III)COMPLEXES | EASTMAN KODAK CO (US) | 1979-07-26 | — | — | WO | claimed |