SCHEMBL30504010

SCHEMBL30504010

COc1cccc2c(OC)c(C)ccc12

nearest known ligand 0.48

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 5/20 0.48
KDM4E B2RXH2 3/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
MAPK1 P28482 2/20 0.48
IDO1 P14902 1/20 0.42
PNMT P11086 1/20 0.41
EP300 Q09472 1/20 0.41
KAT8 Q9H7Z6 1/20 0.41
NQO2 P16083 2/20 0.41
CYP19A1 P11511 1/20 0.41
CA12 O43570 1/20 0.41
CA1 P00915 1/20 0.41
CA2 P00918 1/20 0.41
CA4 P22748 1/20 0.41
CA7 P43166 1/20 0.41
CA9 Q16790 1/20 0.41
CA14 Q9ULX7 1/20 0.41
CYP2A6 P11509 1/20 0.41
HPGD P15428 3/20 0.40
MEN1 O00255 2/20 0.40

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL11310772 1.00 ALDH1A1 (0.48) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL29102423 0.98 ALDH1A1 (0.46) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL17912823 0.83 ALDH1A1 (0.52) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL15315856 0.82 KDM4E (0.52) ALDH1A1KDM4ESMN1; SMN2MAPK1NQO2
SCHEMBL12473426 0.80 CA1 (0.55) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL357145 0.80 CA1 (0.61) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL31116611 0.80 CA1 (0.61) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL9005269 0.79 CYP2A6 (0.62) ALDH1A1KDM4EMAPK1IDO1PNMT
SCHEMBL30503961 0.78 ALDH1A1 (0.46) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1
SCHEMBL19612339 0.78 ALDH1A1 (0.46) ALDH1A1KDM4ESMN1; SMN2MAPK1IDO1

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116360211-A Chemically amplified positive photosensitive resin composition, protective film, and element having protective film 奇美实业股份有限公司 2023-06-30 CN disclosed