Predicted protein targets (top 6)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | CTSV | O60911 | 1/20 | 0.36 |
| ▸ | CTSL | P07711 | 1/20 | 0.36 |
| ▸ | CTSS | P25774 | 1/20 | 0.36 |
| ▸ | CTSK | P43235 | 1/20 | 0.36 |
| ▸ | AR | P10275 | 3/20 | 0.34 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.33 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL14666481 | 0.85 | AR (0.34) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL10234882 | 0.85 | CTSV (0.32) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL12652330 | 0.85 | CTSV (0.32) | CTSVCTSLCTSSCTSK | |
| SCHEMBL685109 | 0.84 | ALDH1A1 (0.37) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL8241182 | 0.83 | CTSV (0.38) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL5063468 | 0.83 | CTSV (0.38) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL5685473 | 0.83 | CTSV (0.38) | CTSVCTSLCTSSCTSKAR | |
| SCHEMBL1697098 | 0.82 | ALDH1A1 (0.35) | CTSVCTSLCTSSCTSKALDH1A1 | |
| SCHEMBL12651228 | 0.82 | CTSV (0.33) | CTSVCTSLCTSSCTSKALDH1A1 | |
| SCHEMBL7558920 | 0.81 | CTSV (0.41) | CTSVCTSLCTSSCTSKAR |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 390 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-1433857-B1 | PROCESS FOR PRODUCING MONOMER | MITSUBISHI RAYON CO (JP) | 2009-06-03 | — | — | EP | claimed |
| US-7125692-B2 | Process for producing monomer | MITSUBISHI RAYON CO., LTD. (JP) | 2006-10-24 | — | — | US | claimed |
| US-20230400765-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| US-20230400765-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | JSR CORPORATION (JP) | 2023-12-14 | — | — | US | disclosed |
| WO-2023095561-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND PATTERN FORMATION METHOD | JSR株式会社 | 2023-06-01 | — | — | WO | disclosed |
| US-20230106095-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR CORPORATION (JP) | 2023-04-06 | — | — | US | disclosed |
| WO-2022186048-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, PATTERN FORMATION METHOD, POLYMER, AND COMPOUND | JSR株式会社 | 2022-09-09 | — | — | WO | disclosed |
| WO-2021241246-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING PATTERN | JSR株式会社 | 2021-12-02 | — | — | WO | disclosed |
| WO-2021140909-A1 | RADIATION-SENSITIVE RESIN COMPOSITION AND METHOD FOR FORMING RESIST PATTERN | JSR株式会社 | 2021-07-15 | — | — | WO | disclosed |
| EP-3253735-B1 | LATENT ACIDS AND THEIR USE | BASF SE (DE) | 2021-03-31 | — | — | EP | disclosed |
| US-20200089116-A1 | Fluorine-Containing Monomer, Fluorine-Containing Polymer, Pattern Forming Composition Using Same, and Pattern Forming Method of Same | CENTRAL GLASS COMPANY, LIMITED (JP) | 2020-03-19 | — | — | US | disclosed |
| US-20020009668-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2002-01-24 | — | — | US | disclosed |
| EP-1164434-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-12-19 | — | — | EP | disclosed |
| US-20010023050-A1 | Radiation-sensitive resin composition | JSR CORPORATION (JP) | 2001-09-20 | — | — | US | disclosed |
| EP-1122605-A2 | Radiation-sensitive resin composition | JSR Corporation (JP) | 2001-08-08 | — | — | EP | disclosed |
| US-6258895-B1 | Polymers having spiro orthoester groups, process of manufacturing and using | THE PROCTER & GAMBLE COMPANY | 2001-07-10 | — | — | US | disclosed |
| US-6177228-B1 | COMPRISING A RADIATION-SENSITIVE ACID GENERATOR AND A POLYMER COMPRISING THE REACTION PRODUCT OF A MONOMER SELECTED FROM METHACRYLATE OR ACRYLATE HAVING A PHOTOACID CLEAVABLE ESTER SUBSTITUENT AND AN UNSATURATED ESTER MONOMER | INTERNATIONAL BUSINESS MACHINES CORPORATION | 2001-01-23 | — | — | US | disclosed |
| US-6165678-A | Lithographic photoresist composition and process for its use in the manufacture of integrated circuits | INTERNATIONAL BUSINESS MACHINES CORPORATION (US) | 2000-12-26 | — | — | US | disclosed |
| EP-0575667-B1 | Process for the manufacture of polymers having spiro orthoester groups, the polymers obtained and their use | PROCTER & GAMBLE (US) | 2000-03-08 | — | — | EP | disclosed |
| EP-0575667-A1 | Process for the manufacture of polymers having spiro orthoester groups, the polymers obtained and their use | THE PROCTER & GAMBLE COMPANY (US) | 1993-12-29 | — | — | EP | disclosed |
Patent text — is the patent's own abstract consistent with the prediction?
For each of this compound's patents that has machine-readable text (1 of them — usually the abstract, not the full specification), we ask MedCPT which protein the text reads most about, and where the chemistry-predicted target lands among 4885 human targets. A high rank means the patent's own wording is consistent with the prediction — a weak, independent signal, not proof of activity.
| Patent | Title | Text reads most about | Predicted target · text-rank |
|---|---|---|---|
| US-20230400765-A1 | RADIATION-SENSITIVE RESIN COMPOSITION, METHOD FOR FORMING PATTERN, AND ONIUM SALT COMPOUND | RFT1, RER1, AFF1 | CTSV 3772/4885CTSL 4476/4885CTSS 3526/4885 |
“Text reads most about” is the patent abstract's nearest protein in MedCPT space (background-debiased). Only ~1.4% of patents have machine-readable text, so most compounds won't have this panel.