Predicted protein targets (top 11)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | SLC1A2 | P43004 | 2/20 | 0.47 |
| ▸ | DPP4 | P27487 | 3/20 | 0.33 |
| ▸ | GRIK1 | P39086 | 2/20 | 0.33 |
| ▸ | GRIK2 | Q13002 | 2/20 | 0.33 |
| ▸ | MEN1 | O00255 | 2/20 | 0.33 |
| ▸ | KMT2A | Q03164 | 2/20 | 0.33 |
| ▸ | TSHR | P16473 | 2/20 | 0.32 |
| ▸ | CTSS | P25774 | 2/20 | 0.31 |
| ▸ | CTSK | P43235 | 2/20 | 0.31 |
| ▸ | SLC1A3 | P43003 | 1/20 | 0.31 |
| ▸ | SLC1A1 | P43005 | 1/20 | 0.31 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL7344236 | 0.76 | GABRP (0.48) | SLC1A2GRIK1GRIK2MEN1KMT2A | |
| SCHEMBL10567437 | 0.74 | SLC1A3 (0.35) | SLC1A2MEN1KMT2ASLC1A3SLC1A1 | |
| Trifluoroacetic Acid SCHEMBL14737086 | 0.70 | SLC1A2 (0.46) | SLC1A2DPP4MEN1KMT2ATSHR | |
| Hydrochloric Acid SCHEMBL3637938 | 0.69 | MEN1 (0.35) | MEN1KMT2A | |
| SCHEMBL6542357 | 0.68 | CTSS (0.32) | CTSSCTSK | |
| SCHEMBL3053286 | 0.68 | SLC1A2 (0.43) | SLC1A2DPP4MEN1KMT2ATSHR | |
| SCHEMBL18663874 | 0.67 | SLC1A2 (0.60) | SLC1A2GRIK1GRIK2TSHRSLC1A3 | |
| SCHEMBL158491 | 0.66 | — | — | |
| SCHEMBL2708260 | 0.66 | — | — | |
| SCHEMBL21411550 | 0.66 | — | — |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 4 patents. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| US-8808975-B2 | Positive resist composition for immersion exposure and pattern-forming method using the same | FUJIFILM CORPORATION (JP) | 2014-08-19 | — | — | US | disclosed |
| US-20100310991-A1 | POSITIVE RESIST COMPOSITION FOR IMMERSION EXPOSURE AND PATTERN-FORMING METHOD USING THE SAME | FUJIFILM CORPORATION (JP) | 2010-12-09 | — | — | US | disclosed |
| US-7803511-B2 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJIFILM CORPORATION (JP) | 2010-09-28 | — | — | US | disclosed |
| US-20070042290-A1 | resin containing acrylic ester monomers capable of increasing solubility in alkali developer by action of acid, acid generator, aryldicycloalkylsulfonium compounds, and nonionic surfactant; semiconductors, integrated circuits | FUJI PHOTO FILM CO., LTD. | 2007-02-22 | — | — | US | disclosed |