Phosphoric Acid

Phosphoric Acid

SCHEMBL305359

O=C(O)CO[N+](=O)[O-].O=P(O)(O)O

nearest known ligand 0.36

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Known targets — ChEMBL curated mechanism

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

The experimentally established mechanism targets of Phosphoric Acid. The predicted profile below is derived independently by chemical similarity — agreement is a validation signal, a miss is honest.

Predicted protein targets (top 14)

geneUniProtsupporting neighboursconfidence
ALDH1A1 P00352 1/20 0.36
MEN1 O00255 2/20 0.34
LMNA P02545 2/20 0.34
BLM P54132 2/20 0.34
KMT2A Q03164 2/20 0.34
HBB P68871 1/20 0.34
HIF1A Q16665 1/20 0.34
TSHR P16473 2/20 0.33
CTH P32929 1/20 0.33
CBS P35520 1/20 0.33
THPO P40225 1/20 0.33
HPGD P15428 1/20 0.33
TDP1 Q9NUW8 1/20 0.33
THRB P10828 1/20 0.32

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL456770 0.91
SCHEMBL28185249 0.88
Ether SCHEMBL5066675 0.78 ALDH1A1 (0.33) ALDH1A1MEN1LMNABLMKMT2A
Methoxyacetic Acid SCHEMBL27701327 0.74 ALDH1A1 (0.33) ALDH1A1MEN1LMNABLMKMT2A
Citric Acid SCHEMBL3862968 0.74 ALDH1A1 (0.56) ALDH1A1MEN1LMNAKMT2AHIF1A
SCHEMBL20377293 0.74 TSHR (0.33) ALDH1A1TSHR
SCHEMBL11671911 0.73 ALDH1A1 (0.36) ALDH1A1MEN1LMNABLMKMT2A
SCHEMBL8939307 0.71 THRB (0.34) MEN1KMT2ATSHRCTHCBS
SCHEMBL2230834 0.71 ALDH1A1 (0.34) ALDH1A1MEN1LMNABLMKMT2A
SCHEMBL28104919 0.70

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 9 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-8093800-B2 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein IDEMITSU KOSAN CO., LTD. (JP) 2012-01-10 US disclosed
EP-1693483-B1 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic el device, and substrate for use therein IDEMITSU KOSAN CO (JP) 2009-10-07 EP disclosed
US-20080309223-A1 SPUTTERING TARGET, SINTERED ARTICLE, CONDUCTIVE FILM FABRICATED BY UTILIZING THE SAME, ORGANIC EL DEVICE, AND SUBSTRATE FOR USE THEREIN IDEMITSU KOSAN CO., LTD. (JP) 2008-12-18 US disclosed
US-7393600-B2 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein IDEMITSU KOSAN CO., LTD. (JP) 2008-07-01 US disclosed
US-7306861-B2 Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the same IDEMITSU KOSAN CO., LTD. (JP) 2007-12-11 US disclosed
US-20060234088-A1 Sputtering target, sintered compact, electrically conductive film produced by using the same, and organic EL device and substrate used for the same IDEMITSU KOSAN CO., LTD. (JP) 2006-10-19 US disclosed
EP-1693483-A2 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic el device, and substrate for use therein Idemitsu Kosan Co., Ltd. (JP) 2006-08-23 EP disclosed
EP-1536034-A1 SPUTTERING TARGET, SINTERED BODY, CONDUCTIVE FILM FORMED BY USING THEM, ORGANIC EL DEVICE, AND SUBSTRATE USED FOR THE ORGANIC EL DEVICE IDEMITSU KOSAN COMPANY LIMITED (JP) 2005-06-01 EP disclosed
US-20040081836-A1 Sputtering target, sintered article, conductive film fabricated by utilizing the same, organic EL device, and substrate for use therein IDEMITSU KOSAN CO., LTD. (JP) 2004-04-29 US disclosed