SCHEMBL3056449

SCHEMBL3056449

C=CC(=C)[Si](C)(C)C

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL31707460 0.79 ALDH1A1 (0.41)
SCHEMBL7913331 0.73
SCHEMBL8649263 0.71 ALDH1A1 (0.35)
SCHEMBL9492037 0.69 ALDH1A1 (0.33)
SCHEMBL611123 0.69 ALDH1A1 (0.33)
SCHEMBL10348359 0.69
SCHEMBL20272489 0.69
SCHEMBL8651889 0.67 ALDH1A1 (0.32)
SCHEMBL3490972 0.67 ALDH1A1 (0.44)
SCHEMBL2496519 0.65 ALDH1A1 (0.35)

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 20 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-6583048-B2 Chemical vapor deposition from a silyl ether, a silyl ether oligomer, or an organosilicon compound containing one or more reactive groups, to form an interlayer dielectric film having a dielectric constant of 3.5 or less. AIR PRODUCTS AND CHEMICALS, INC. 2003-06-24 US claimed
US-20020142579-A1 ORGANOSILICON PRECURSORS FOR INTERLAYER DIELECTRIC FILMS WITH LOW DIELECTRIC CONSTANTS VERSUM MATERIALS US, LLC 2002-10-03 US claimed
EP-1225194-A2 Method of forming a dielectric interlayer film with organosilicon precursors AIR PRODUCTS AND CHEMICALS, INC. (US) 2002-07-24 EP claimed
JP-55027162-A None JP disclosed
US-20230380274-A1 ORTHO-SUBSTITUTED THERMALLY ACTIVATED DELAYED FLUORESCENCE MATERIAL AND ORGANIC LIGHT-EMITTING DEVICE COMPRISING SAME SAMSUNG DISPLAY CO., LTD. (KR) 2023-11-23 US disclosed
US-8217137-B2 Fullerene-based amino acids WILLIAM MARSH RICE UNIVERSITY (US) 2012-07-10 US disclosed
US-8084294-B2 Method of fabricating organic silicon film, semiconductor device including the same, and method of fabricating the semiconductor device NEC CORPORATION (JP) 2011-12-27 US disclosed
US-20100267747-A1 5-(Arylsulfonyl)-Pyrazolopiperidines ELAN PHARMACEUTICALS, INC. (US) 2010-10-21 US disclosed
US-7732609-B2 5-(arylsulfonyl)-pyrazolopiperidines ELAN PHARMACEUTICALS, INC. (US) 2010-06-08 US disclosed
US-20090197315-A1 FULLERENE-BASED AMINO ACIDS WILLIAM MARSH RICE UNIVERSITY (US) 2009-08-06 US disclosed
CN-101370776-A 5-(arylsulfonyl)-pyrazolopiperidines ELAN PHARM INC (US) 2009-02-18 CN disclosed
US-20080251926-A1 Method of Fabricating Organic Silicon Film, Semiconductor Device Including the Same, and Method of Fabricating the Semiconductor Device NEC CORPORATION (JP) 2008-10-16 US disclosed
EP-1957458-A2 5-(ARYLSULFONYL)-PYRAZOLOPIPERIDINES Elan Pharmaceuticals Inc. (US) 2008-08-20 EP disclosed
US-20070155753-A1 5-(Arylsulfonyl)-Pyrazolopiperidines ELAN PHARMACEUTICALS, INC. 2007-07-05 US disclosed
WO-2007064914-A2 5-(ARYLSULFONYL)-PYRAZOLOPIPERIDINES ELAN PHARMACEUTICALS, INC. (US) 2007-06-07 WO disclosed
EP-1713723-A2 FULLERENE BASED AMINO ACIDS William Marsh Rice University (US) 2006-10-25 EP disclosed
WO-2005070827-A2 FULLERENE BASED AMINO ACIDS WILLIAM MARSH RICE UNIVERSITY (US) 2005-08-04 WO disclosed
US-5489659-A Catalyst component for use in the polymerization of α-olefins and process for producing α-olefin polymers using the same MITSUBISHI CHEMICAL CORPORATION (JP) 1996-02-06 US disclosed
EP-0611773-A2 Catalyst component for use in the polymerization of alpha-olefins and process for producing alpha-olefin polymers using the same MITSUBISHI CHEMICAL CORPORATION (JP) 1994-08-24 EP disclosed
JP-S5527162-A 2-SILYLMETHYLBUTADIENE DERIVATVE MITSUBISHI CHEM IND LTD 1980-02-27 JP disclosed