SCHEMBL30577408

SCHEMBL30577408

CC(C)P(C(C)C)C(C)C.CC(C)P(C(C)C)C(C)C.Fc1c(F)c(F)c([B-](c2c(F)c(F)c(F)c(F)c2F)(c2c(F)c(F)c(F)c(F)c2F)c2c(F)c(F)c(F)c(F)c2F)c(F)c1F.[Pd+]

nearest known ligand 0.00

⚠ Novel chemotype — no close known analogue (best Tanimoto < 0.3). Unexplored chemical space relative to ChEMBL.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Acetonitrile SCHEMBL3267900 0.87 — —
Acetic Acid SCHEMBL30577413 0.83 CA1 (0.31) —
SCHEMBL29776478 0.78 — —
Acetic Acid SCHEMBL1469783 0.76 — —
Isopropylamine SCHEMBL8760333 0.76 — —
Isopropyl Alcohol SCHEMBL6142886 0.76 ALDH1A1 (0.35) —
Isopropyl Alcohol SCHEMBL28931811 0.76 ALDH1A1 (0.35) —
SCHEMBL22478 0.74 — —
SCHEMBL8591536 0.74 — —
Isopropyl Alcohol SCHEMBL1452102 0.74 ALDH1A1 (0.33) —

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 1 patent. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
CN-116848467-A Photosensitive resin composition, cured film, and semiconductor device 住友电木株式会社 2023-10-03 — — CN disclosed
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