SCHEMBL30596298

SCHEMBL30596298

COc1ccc(C[P+](c2ccccc2)(c2ccccc2)c2ccccc2)cc1OC

nearest known ligand 0.54

Predicted protein targets (top 20)

geneUniProtsupporting neighboursconfidence
LDHA P00338 1/20 0.54
CA2 P00918 1/20 0.53
KMT2A Q03164 2/20 0.48
LMNA P02545 3/20 0.48
SMN1; SMN2 Q16637 2/20 0.48
MAPT P10636 2/20 0.48
TTR P02766 1/20 0.47
KDM4E B2RXH2 2/20 0.47
ATM Q13315 2/20 0.47
ALOX15 P16050 1/20 0.46
ALOX12 P18054 1/20 0.46
ALDH1A1 P00352 2/20 0.46
PPARG P37231 1/20 0.46
PPARD Q03181 1/20 0.46
PPARA Q07869 1/20 0.46
SNCA P37840 1/20 0.46
KDM1A O60341 1/20 0.46
ADRB2 P07550 1/20 0.46
ABCB1 P08183 1/20 0.46
ABCG2 Q9UNQ0 1/20 0.46

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
Hydrochloric Acid SCHEMBL10424163 0.98 LDHA (0.53) LDHACA2KMT2ALMNASMN1; SMN2
Bromide SCHEMBL4260842 0.98 LDHA (0.53) LDHACA2KMT2ALMNASMN1; SMN2
Bromide SCHEMBL29880790 0.98 LDHA (0.53) LDHACA2KMT2ALMNASMN1; SMN2
Hydrochloric Acid SCHEMBL4887981 0.87 MAPK1 (0.53) KMT2ALMNASMN1; SMN2KDM4EALDH1A1
Bromide SCHEMBL28338224 0.86 CALM1 (0.43) LDHACA2KMT2ALMNASMN1; SMN2
Bromide SCHEMBL5440664 0.85 SNCA (0.45) LDHASMN1; SMN2SNCA
Hydrochloric Acid SCHEMBL3536559 0.85 KDM1A (0.45) LDHAKMT2ASMN1; SMN2MAPTTTR
Hydrochloric Acid SCHEMBL9553726 0.84 PTGS1 (0.54) LDHAKMT2ASMN1; SMN2ADRB2TDP1
Bromide SCHEMBL5407745 0.84 KDM1A (0.46) LDHALMNASMN1; SMN2ALDH1A1SNCA
Hydrochloric Acid SCHEMBL5417557 0.84 KDM1A (0.46) LDHALMNASMN1; SMN2ALDH1A1SNCA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 10 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-20250235805-A1 LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS TOKUYAMA CORPORATION (JP) 2025-07-24 US disclosed
US-20250215574-A1 SEMICONDUCTOR TREATMENT LIQUID FOR REMOVING RUTHENIUM SILICIDE TOKUYAMA CORPORATION (JP) 2025-07-03 US disclosed
CN-119948603-A Dry etching residue removing liquid 株式会社德山 2025-05-06 CN disclosed
US-20250084309-A1 SEMICONDUCTOR PROCESSING SOLUTION TOKUYAMA CORPORATION (JP) 2025-03-13 US disclosed
EP-4506982-A1 LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS TOKUYAMA CORPORATION (JP) 2025-02-12 EP disclosed
CN-118974895-A Filter lubricant containing onium ion 株式会社德山 2024-11-15 CN disclosed
WO-2024143473-A1 DECOMPOSITION INHIBITOR FOR TRANSITION METAL OXIDANTS 株式会社トクヤマ 2024-07-04 WO disclosed
WO-2024075704-A1 SEMICONDUCTOR PROCESSING SOLUTION 株式会社トクヤマ 2024-04-11 WO disclosed
WO-2024071417-A1 DRY ETCHING RESIDUE REMOVING SOLUTION 株式会社トクヤマ 2024-04-04 WO disclosed
WO-2023190984-A1 LUBRICANT FOR FILTRATION CONTAINING ONIUM IONS 株式会社トクヤマ 2023-10-05 WO disclosed