SCHEMBL3064948

SCHEMBL3064948

C=CCNCC(=O)OC(=O)CNCC=C

nearest known ligand 0.39

Predicted protein targets (top 10)

geneUniProtsupporting neighboursconfidence
KMT2A Q03164 1/20 0.39
KDM4E B2RXH2 2/20 0.38
TSHR P16473 2/20 0.37
SMN1; SMN2 Q16637 1/20 0.37
MAPT P10636 1/20 0.37
ALDH1A1 P00352 2/20 0.36
LMNA P02545 1/20 0.36
HTT P42858 1/20 0.31
PKM P14618 1/20 0.31
FAAH O00519 1/20 0.31

Click a target to see other patent compounds predicted against it — the reverse direction, in place.

Similar compounds — the chemically nearest patent molecules

Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.

Compoundsimilaritytop predictedshared targets
SCHEMBL9978608 0.87 ALDH1A1 (0.36) KMT2AKDM4ETSHRSMN1; SMN2MAPT
SCHEMBL713525 0.84
Hydrochloric Acid SCHEMBL929671 0.82 LMNA (0.47) KMT2AKDM4ETSHRSMN1; SMN2MAPT
SCHEMBL288922 0.79 GAA (0.48) KMT2ASMN1; SMN2MAPTALDH1A1LMNA
SCHEMBL9978462 0.77 KDM4E (0.54) KMT2AKDM4ETSHRSMN1; SMN2MAPT
SCHEMBL8134939 0.77 TSHR (0.41) KMT2AKDM4ETSHRSMN1; SMN2MAPT
SCHEMBL2710714 0.77 KDM4E (0.36) KMT2AKDM4ETSHRSMN1; SMN2ALDH1A1
Hydrochloric Acid SCHEMBL11730776 0.77 GAA (0.46) KMT2ASMN1; SMN2MAPTALDH1A1LMNA
SCHEMBL8824199 0.76 TSHR (0.36) KDM4ETSHRSMN1; SMN2ALDH1A1LMNA
Hydrochloric Acid SCHEMBL17497525 0.76 KDM4E (0.36) KMT2AKDM4ESMN1; SMN2ALDH1A1LMNA

Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.

Patent provenance — the patents this molecule appears in, and who filed them

Claimed or disclosed in 3 patents. claimed = in the patent's claims; disclosed = body only.

PatentTitleAssigneePublishedPriorityFilingCountryStatus
US-7776507-B2 Photosensitive paste and manufacturing method of member for display panel TORAY INDUSTRIES, INC. (JP) 2010-08-17 US disclosed
US-20090035452-A1 Photosensitive paste and manufacturing method of member for display panel TORAY INDUSTRIES, INC. (JP) 2009-02-05 US disclosed
US-20020192549-A1 Electrode composition, and lithium secondary battery TDK CORPORATION (JP) 2002-12-19 US disclosed