Predicted protein targets (top 20)
| gene | UniProt | supporting neighbours | confidence | |
|---|---|---|---|---|
| ▸ | KDM4E | B2RXH2 | 7/20 | 0.71 |
| ▸ | MAPT | P10636 | 4/20 | 0.71 |
| ▸ | KMT2A | Q03164 | 4/20 | 0.71 |
| ▸ | SMN1; SMN2 | Q16637 | 2/20 | 0.71 |
| ▸ | POLB | P06746 | 2/20 | 0.71 |
| ▸ | KDM1A | O60341 | 2/20 | 0.71 |
| ▸ | MITF | O75030 | 1/20 | 0.71 |
| ▸ | LMNA | P02545 | 1/20 | 0.71 |
| ▸ | RAD52 | P43351 | 1/20 | 0.71 |
| ▸ | RECQL | P46063 | 1/20 | 0.71 |
| ▸ | NPSR1 | Q6W5P4 | 1/20 | 0.71 |
| ▸ | L3MBTL1 | Q9Y468 | 1/20 | 0.71 |
| ▸ | GAA | P10253 | 4/20 | 0.62 |
| ▸ | GLA | P06280 | 3/20 | 0.62 |
| ▸ | ATM | Q13315 | 3/20 | 0.62 |
| ▸ | ALDH1A1 | P00352 | 1/20 | 0.62 |
| ▸ | HPGD | P15428 | 1/20 | 0.62 |
| ▸ | RAB9A | P51151 | 3/20 | 0.54 |
| ▸ | MEN1 | O00255 | 3/20 | 0.54 |
| ▸ | NPC1 | O15118 | 2/20 | 0.54 |
Click a target to see other patent compounds predicted against it — the reverse direction, in place.
Similar compounds — the chemically nearest patent molecules
Nearest neighbours by Morgan-fingerprint cosine across the patent-compound collection, with each neighbour's top predicted target and the predicted targets it shares with this molecule.
| Compound | similarity | top predicted | shared targets | |
|---|---|---|---|---|
| SCHEMBL17154400 | 0.83 | KDM1A (1.00) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL13134235 | 0.82 | KDM4E (0.55) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL557798 | 0.81 | KDM4E (0.62) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL17154374 | 0.80 | KMT2A (0.76) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL27820459 | 0.79 | KDM4E (0.69) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL8899556 | 0.78 | ABCC9 (0.55) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL10646480 | 0.78 | KDM4E (0.55) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL8472225 | 0.78 | HTT (0.71) | KDM4EMAPTGAAACHERIPK1 | |
| SCHEMBL21092381 | 0.78 | KDM4E (0.58) | KDM4EMAPTKMT2ASMN1; SMN2POLB | |
| SCHEMBL9300852 | 0.77 | KMT2A (0.72) | KDM4EMAPTKMT2ASMN1; SMN2POLB |
Similarity is cosine over the 2,048-bit Morgan fingerprint (≈ Tanimoto). Identical fingerprints score 1.00.
Patent provenance — the patents this molecule appears in, and who filed them
Claimed or disclosed in 170 patents — showing the first 20. claimed = in the patent's claims; disclosed = body only.
| Patent | Title | Assignee | Published | Priority | Filing | Country | Status |
|---|---|---|---|---|---|---|---|
| EP-0626431-B1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO LTD (JP) | 2000-01-26 | — | — | EP | claimed |
| US-5429846-A | Antimony oxide-containing tin oxide powder, (meth) acrylate compound, acetal resin, photopolymerization initiator and organic solvent | SEKISUI CHEMICAL CO., LTD. (JP) | 1995-07-04 | — | — | US | claimed |
| EP-0626431-A1 | PHOTOCURABLE CONDUCTIVE COATING COMPOSITION | SEKISUI CHEMICAL CO., LTD. (JP) | 1994-11-30 | — | — | EP | claimed |
| US-4780393-A | POLYMERIC BINDER, TERMINAL ETHYLENIC COMPOUND, PHOTOINITIATOR, LEVCO BASE OF TRIARYLMETHANE DYE AND PHOTOC ROMIC SPIRO-INDOLINO-BENZOPYRAN COMPOUND | HOECHST AKTIENGESELLSCHAFT (DE) | 1988-10-25 | — | — | US | claimed |
| US-4485166-A | CROSSLINKABLE BLEND OF UNSATURATED COMPOUND, BINDER, ACTIVATOR, AND EPOXIDE | HOECHST AKTIENGESELLSCHAFT (DE) | 1984-11-27 | — | — | US | claimed |
| US-4387139-A | Elastomeric, ethylenically unsaturated polyurethanes and radiation polymerizable mixtures containing such polyurethanes | KALLE, NIEDERLASSUNG DER HOECHST AG (DE) | 1983-06-07 | — | — | US | claimed |
| CN-109188865-B | Photosensitive covering film composition and application thereof | 浙江福斯特新材料研究院有限公司 | 2022-03-15 | — | — | CN | disclosed |
| CN-101858994-B | Low reflection film | TORAY ADVANCED MAT KOREA INC | 2013-09-11 | — | — | CN | disclosed |
| CN-101441282-B | Stacking film for optical application | TORAY SAEHAN INC | 2012-11-28 | — | — | CN | disclosed |
| CN-101315431-B | Rainbow phenomenon-reduction anti-reflection film with optimized anti-reflection effect | TORAY SAEHAN INC | 2011-11-23 | — | — | CN | disclosed |
| CN-102136223-A | Display filter and its manufacturing method, and display manufacturing method | TORAY INDUSTRIES | 2011-07-27 | — | — | CN | disclosed |
| CN-101512621-B | Filter for display, method for manufacturing same, and method for manufacturing display | TORAY INDUSTRIES | 2011-05-04 | — | — | CN | disclosed |
| US-7833607-B2 | includes substrate film, a hard coat layer containing a (meth)acrylate compound, an electrically conductive layer containing electrically conductive particles, and a resin layer containing a fluorine compound; antireflection films for screens of displays such as cathode ray tubes, liquid crystal devices | TORAY INDUSTRIES, INC. (JP) | 2010-11-16 | — | — | US | disclosed |
| EP-0006125-A1 | Photopolymerisable mixture and light-sensitive coating material | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| EP-0006124-A1 | Photopolymerisable mixture and light-sensitive coating material | HOECHST AKTIENGESELLSCHAFT (DE) | 1980-01-09 | — | — | EP | disclosed |
| EP-0005750-A1 | Photopolymerisable mixture and light-sensitive coating material | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-12-12 | — | — | EP | disclosed |
| US-4175964-A | SUCCESSIVE SURFACE TREATMENT WITH AQUEOUS SOLUTIONS OF PHOSPHORIC ACID AND SILICIC ACID OR ITS SALTS | FUJI PHOTO FILM CO., LTD. (JP) | 1979-11-27 | — | — | US | disclosed |
| EP-0003804-A1 | Photopolymerizable composition containing a monoazo dye | HOECHST AKTIENGESELLSCHAFT (DE) | 1979-09-05 | — | — | EP | disclosed |
| US-4019972-A | Photopolymerizable copying compositions containing biuret-based polyfunctional monomers | HOECHST AKTIENGESELLSCHAFT (DT) | 1977-04-26 | — | — | US | disclosed |
| US-3930865-A | PHOTOINITIATOR, TERPOLYMER CONTAINING UNSATURATED CARBOXYLIC ACID, ALKYL METHACRYLATE | HOECHST AKTIENGESELLSCHAFT (DT) | 1976-01-06 | — | — | US | disclosed |